Influence of the deposition parameters on the composition, structure and X-ray photoelectron spectroscopy spectra of TiN films
Тип публикации: Journal Article
Дата публикации: 1992-07-01
SCImago Q2
WOS Q3
БС1
SJR: 0.408
CiteScore: 4.3
Impact factor: 2.4
ISSN: 00406090, 18792731
Materials Chemistry
Metals and Alloys
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Краткое описание
The composition, structure and electronic structure of TiN films synthesized by the arc method have been studied by means of X-ray photoelectron spectroscopy (XPS) and electron microscopy. Dependences of the film composition and structure on the deposition parameters (working gas pressure, potential and temperature of the substrate, cathode current) were obtained. Also established was the dependence of the binding energy changes of the Ti 2p and N 1s core electron levels and valence band on the nitrogen content in nitride films. With increasing nitrogen concentration, the XPS Ti 2p line was found to be chemically shifted toward higher binding energies (from 454.1 eV for titanium to 455.2 eV for TiN0.81), which provides evidence that, during TiNx formation, the positive effective charge on titanium atoms increases.
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KUZNETSOV M. et al. Influence of the deposition parameters on the composition, structure and X-ray photoelectron spectroscopy spectra of TiN films // Thin Solid Films. 1992. Vol. 215. No. 1. pp. 1-7.
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KUZNETSOV M., Zhuravlev M. V., Shalayeva E. V., Gubanov V. Influence of the deposition parameters on the composition, structure and X-ray photoelectron spectroscopy spectra of TiN films // Thin Solid Films. 1992. Vol. 215. No. 1. pp. 1-7.
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TY - JOUR
DO - 10.1016/0040-6090(92)90692-5
UR - https://doi.org/10.1016/0040-6090(92)90692-5
TI - Influence of the deposition parameters on the composition, structure and X-ray photoelectron spectroscopy spectra of TiN films
T2 - Thin Solid Films
AU - KUZNETSOV, M.
AU - Zhuravlev, M V
AU - Shalayeva, E V
AU - Gubanov, V.A.
PY - 1992
DA - 1992/07/01
PB - Elsevier
SP - 1-7
IS - 1
VL - 215
SN - 0040-6090
SN - 1879-2731
ER -
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@article{1992_KUZNETSOV,
author = {M. KUZNETSOV and M V Zhuravlev and E V Shalayeva and V.A. Gubanov},
title = {Influence of the deposition parameters on the composition, structure and X-ray photoelectron spectroscopy spectra of TiN films},
journal = {Thin Solid Films},
year = {1992},
volume = {215},
publisher = {Elsevier},
month = {jul},
url = {https://doi.org/10.1016/0040-6090(92)90692-5},
number = {1},
pages = {1--7},
doi = {10.1016/0040-6090(92)90692-5}
}
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MLA
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KUZNETSOV, M., et al. “Influence of the deposition parameters on the composition, structure and X-ray photoelectron spectroscopy spectra of TiN films.” Thin Solid Films, vol. 215, no. 1, Jul. 1992, pp. 1-7. https://doi.org/10.1016/0040-6090(92)90692-5.
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