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Open access
volume 7 publication number e4

Technology development for ultraintense all-OPCPA systems

J. Bromage 1
S. W. Bahk 1
I. A. Begishev 1
C.  Dorrer 1
M. J. Guardalben 1
B N Hoffman 1
J. B. Oliver 1
R. G. Roides 1
E M Schiesser 1
M J Shoup Iii 1
M. Spilatro 1
B. WEBB 1
D Weiner 1
J. D. Zuegel 1
Publication typeJournal Article
Publication date2019-02-08
scimago Q1
wos Q1
SJR0.991
CiteScore7.6
Impact factor5.7
ISSN20954719, 20523289
Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Nuclear and High Energy Physics
Nuclear Energy and Engineering
Abstract

Optical parametric chirped-pulse amplification (OPCPA) [Dubietis et al., Opt. Commun. 88, 437 (1992)] implemented by multikilojoule Nd:glass pump lasers is a promising approach to produce ultraintense pulses (${>}10^{23}~\text{W}/\text{cm}^{2}$). Technologies are being developed to upgrade the OMEGA EP Laser System with the goal to pump an optical parametric amplifier line (EP OPAL) with two of the OMEGA EP beamlines. The resulting ultraintense pulses (1.5 kJ, 20 fs, $10^{24}~\text{W}/\text{cm}^{2}$) would be used jointly with picosecond and nanosecond pulses produced by the other two beamlines. A midscale OPAL pumped by the Multi-Terawatt (MTW) laser is being constructed to produce 7.5-J, 15-fs pulses and demonstrate scalable technologies suitable for the upgrade. MTW OPAL will share a target area with the MTW laser (50 J, 1 to 100 ps), enabling several joint-shot configurations. We report on the status of the MTW OPAL system, and the technology development required for this class of all-OPCPA laser system for ultraintense pulses.

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GOST Copy
Bromage J. et al. Technology development for ultraintense all-OPCPA systems // High Power Laser Science and Engineering. 2019. Vol. 7. e4
GOST all authors (up to 50) Copy
Bromage J., Bahk S. W., Begishev I. A., Dorrer C., Guardalben M. J., Hoffman B. N., Oliver J. B., Roides R. G., Schiesser E. M., Shoup Iii M. J., Spilatro M., WEBB B., Weiner D., Zuegel J. D. Technology development for ultraintense all-OPCPA systems // High Power Laser Science and Engineering. 2019. Vol. 7. e4
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.1017/hpl.2018.64
UR - https://doi.org/10.1017/hpl.2018.64
TI - Technology development for ultraintense all-OPCPA systems
T2 - High Power Laser Science and Engineering
AU - Bromage, J.
AU - Bahk, S. W.
AU - Begishev, I. A.
AU - Dorrer, C. 
AU - Guardalben, M. J.
AU - Hoffman, B N
AU - Oliver, J. B.
AU - Roides, R. G.
AU - Schiesser, E M
AU - Shoup Iii, M J
AU - Spilatro, M.
AU - WEBB, B.
AU - Weiner, D
AU - Zuegel, J. D.
PY - 2019
DA - 2019/02/08
PB - Cambridge University Press
VL - 7
SN - 2095-4719
SN - 2052-3289
ER -
BibTex
Cite this
BibTex (up to 50 authors) Copy
@article{2019_Bromage,
author = {J. Bromage and S. W. Bahk and I. A. Begishev and C.  Dorrer and M. J. Guardalben and B N Hoffman and J. B. Oliver and R. G. Roides and E M Schiesser and M J Shoup Iii and M. Spilatro and B. WEBB and D Weiner and J. D. Zuegel},
title = {Technology development for ultraintense all-OPCPA systems},
journal = {High Power Laser Science and Engineering},
year = {2019},
volume = {7},
publisher = {Cambridge University Press},
month = {feb},
url = {https://doi.org/10.1017/hpl.2018.64},
pages = {e4},
doi = {10.1017/hpl.2018.64}
}