P-type Doping in Large-Area Monolayer MoS2 by Chemical Vapor Deposition
Mengge Li
1
,
Jiadong Yao
1
,
Xiaoxiang Wu
1
,
Shucheng Zhang
1
,
Boran Xing
1
,
Xinyue Niu
1
,
Xiaoyuan Yan
1
,
Y. Yu
1
,
Yali Liu
1
,
Yewu Wang
1, 2
Publication type: Journal Article
Publication date: 2020-01-15
scimago Q1
wos Q1
SJR: 1.921
CiteScore: 14.5
Impact factor: 8.2
ISSN: 19448244, 19448252
PubMed ID:
31937099
General Materials Science
Abstract
Molybdenum disulfide (MoS2) with excellent properties has been widely reported in recent years. However, it is a great challenge to achieve p-type conductivity in MoS2 because of its native stubborn n-type conductivity. Substitutional transition metal doping has been proved to be an effective approach to tune their intrinsic properties and enhance device performance. Herein, we report the growth of Nb-doping large-area monolayer MoS2 by a one-step salt-assisted chemical vapor deposition method. Electrical measurements indicate that Nb doping suppresses n-type conductivity in MoS2 and shows an ambipolar transport behavior after annealing under the sulfur atmosphere, which highlights the p-type doping effect via Nb, corresponding to the density functional theory calculations with Fermi-level shifting to valence band maximum. This work provides a promising approach of two-dimensional materials in electronic and optoelectronic applications.
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Citations from 2024:
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Li M. et al. P-type Doping in Large-Area Monolayer MoS2 by Chemical Vapor Deposition // ACS applied materials & interfaces. 2020. Vol. 12. No. 5. pp. 6276-6282.
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Li M., Yao J., Wu X., Zhang S., Xing B., Niu X., Yan X., Yu Y., Liu Y., Wang Y. P-type Doping in Large-Area Monolayer MoS2 by Chemical Vapor Deposition // ACS applied materials & interfaces. 2020. Vol. 12. No. 5. pp. 6276-6282.
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TY - JOUR
DO - 10.1021/acsami.9b19864
UR - https://doi.org/10.1021/acsami.9b19864
TI - P-type Doping in Large-Area Monolayer MoS2 by Chemical Vapor Deposition
T2 - ACS applied materials & interfaces
AU - Li, Mengge
AU - Yao, Jiadong
AU - Wu, Xiaoxiang
AU - Zhang, Shucheng
AU - Xing, Boran
AU - Niu, Xinyue
AU - Yan, Xiaoyuan
AU - Yu, Y.
AU - Liu, Yali
AU - Wang, Yewu
PY - 2020
DA - 2020/01/15
PB - American Chemical Society (ACS)
SP - 6276-6282
IS - 5
VL - 12
PMID - 31937099
SN - 1944-8244
SN - 1944-8252
ER -
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@article{2020_Li,
author = {Mengge Li and Jiadong Yao and Xiaoxiang Wu and Shucheng Zhang and Boran Xing and Xinyue Niu and Xiaoyuan Yan and Y. Yu and Yali Liu and Yewu Wang},
title = {P-type Doping in Large-Area Monolayer MoS2 by Chemical Vapor Deposition},
journal = {ACS applied materials & interfaces},
year = {2020},
volume = {12},
publisher = {American Chemical Society (ACS)},
month = {jan},
url = {https://doi.org/10.1021/acsami.9b19864},
number = {5},
pages = {6276--6282},
doi = {10.1021/acsami.9b19864}
}
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Li, Mengge, et al. “P-type Doping in Large-Area Monolayer MoS2 by Chemical Vapor Deposition.” ACS applied materials & interfaces, vol. 12, no. 5, Jan. 2020, pp. 6276-6282. https://doi.org/10.1021/acsami.9b19864.