Atomic Layer Deposition in a Metal–Organic Framework: Synthesis, Characterization, and Performance of a Solid Acid
Martino Rimoldi
1
,
Varinia Bernales
2
,
Joshua Borycz
2
,
Aleksei Vjunov
3
,
I S Kim
5
,
J L Fulton
3
,
Alex Martinson
5
,
Johannes A. Lercher
3, 6
,
Karena Chapman
4
,
Laura Gagliardi
2
,
Joseph T. Hupp
1
,
Omar K. Farha
1, 7
6
Department
of Chemistry and Catalysis Research Institute, TU München, Lichtenbergstrasse
4, 85748 Garching, Germany
|
Publication type: Journal Article
Publication date: 2017-01-23
scimago Q1
wos Q1
SJR: 2.065
CiteScore: 12.0
Impact factor: 7.0
ISSN: 08974756, 15205002
Materials Chemistry
General Chemistry
General Chemical Engineering
Abstract
NU-1000, a zirconium-based metal–organic framework (MOF) featuring mesoporous channels, has been postsynthetically metalated via atomic layer deposition in a MOF (AIM) employing dimethylaluminum iso-propoxide ([AlMe2OiPr]2, DMAI), a milder precursor than widely used trimethylaluminum (AlMe3, TMA). The aluminum-modified NU-1000 (Al-NU-1000) has been characterized with a comprehensive suite of techniques that points to the formation of aluminum oxide clusters well dispersed through the framework and stabilized by confinement within small pores intrinsic to the NU-1000 structure. Experimental evidence allows for identification of spectroscopic similarities between Al-NU-1000 and γ-Al2O3. Density functional theory modeling provides structures and simulated spectra, the relevance of which can be assessed via comparison to experimental IR and EXAFS data. The catalytic performance of Al-NU-1000 has been benchmarked against γ-Al2O3, with promising results in terms of selectivity.
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49
Total citations:
49
Citations from 2024:
5
(10.2%)
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MLA
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GOST
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Rimoldi M. et al. Atomic Layer Deposition in a Metal–Organic Framework: Synthesis, Characterization, and Performance of a Solid Acid // Chemistry of Materials. 2017. Vol. 29. No. 3. pp. 1058-1068.
GOST all authors (up to 50)
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Rimoldi M., Bernales V., Borycz J., Vjunov A., Gallington L., Platero-Prats A. E., Kim I. S., Fulton J. L., Martinson A., Lercher J. A., Chapman K., Cramer C. S., Gagliardi L., Hupp J. T., Farha O. K. Atomic Layer Deposition in a Metal–Organic Framework: Synthesis, Characterization, and Performance of a Solid Acid // Chemistry of Materials. 2017. Vol. 29. No. 3. pp. 1058-1068.
Cite this
RIS
Copy
TY - JOUR
DO - 10.1021/acs.chemmater.6b03880
UR - https://doi.org/10.1021/acs.chemmater.6b03880
TI - Atomic Layer Deposition in a Metal–Organic Framework: Synthesis, Characterization, and Performance of a Solid Acid
T2 - Chemistry of Materials
AU - Rimoldi, Martino
AU - Bernales, Varinia
AU - Borycz, Joshua
AU - Vjunov, Aleksei
AU - Gallington, Leighanne
AU - Platero-Prats, Ana E.
AU - Kim, I S
AU - Fulton, J L
AU - Martinson, Alex
AU - Lercher, Johannes A.
AU - Chapman, Karena
AU - Cramer, Christopher S.
AU - Gagliardi, Laura
AU - Hupp, Joseph T.
AU - Farha, Omar K.
PY - 2017
DA - 2017/01/23
PB - American Chemical Society (ACS)
SP - 1058-1068
IS - 3
VL - 29
SN - 0897-4756
SN - 1520-5002
ER -
Cite this
BibTex (up to 50 authors)
Copy
@article{2017_Rimoldi,
author = {Martino Rimoldi and Varinia Bernales and Joshua Borycz and Aleksei Vjunov and Leighanne Gallington and Ana E. Platero-Prats and I S Kim and J L Fulton and Alex Martinson and Johannes A. Lercher and Karena Chapman and Christopher S. Cramer and Laura Gagliardi and Joseph T. Hupp and Omar K. Farha},
title = {Atomic Layer Deposition in a Metal–Organic Framework: Synthesis, Characterization, and Performance of a Solid Acid},
journal = {Chemistry of Materials},
year = {2017},
volume = {29},
publisher = {American Chemical Society (ACS)},
month = {jan},
url = {https://doi.org/10.1021/acs.chemmater.6b03880},
number = {3},
pages = {1058--1068},
doi = {10.1021/acs.chemmater.6b03880}
}
Cite this
MLA
Copy
Rimoldi, Martino, et al. “Atomic Layer Deposition in a Metal–Organic Framework: Synthesis, Characterization, and Performance of a Solid Acid.” Chemistry of Materials, vol. 29, no. 3, Jan. 2017, pp. 1058-1068. https://doi.org/10.1021/acs.chemmater.6b03880.