Journal of Physical Chemistry Letters, volume 6, issue 23, pages 4767-4773

Free-Energy Barriers and Reaction Mechanisms for the Electrochemical Reduction of CO on the Cu(100) Surface, Including Multiple Layers of Explicit Solvent at pH 0.

Publication typeJournal Article
Publication date2015-11-17
Quartile SCImago
Q1
Quartile WOS
Q1
Impact factor5.7
ISSN19487185
Physical and Theoretical Chemistry
General Materials Science
Abstract
The great interest in the photochemical reduction from CO2 to fuels and chemicals has focused attention on Cu because of its unique ability to catalyze formation of carbon-containing fuels and chemicals. A particular goal is to learn how to modify the Cu catalysts to enhance the production selectivity while reducing the energy requirements (overpotential). To enable such developments, we report here the free-energy reaction barriers and mechanistic pathways on the Cu(100) surface, which produces only CH4 (not C2H4 or CH3OH) in acid (pH 0). We predict a threshold potential for CH4 formation of -0.52 V, which compares well to experiments at low pH, -0.45 to -0.50 V. These quantum molecular dynamics simulations included ∼5 layers of explicit water at the water/electrode interface using enhanced sampling methodology to obtain the free energies. We find that that chemisorbed hydroxyl-methylene (CH-OH) is the key intermediate determining the selectivity for methane over methanol.

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Cheng T., Xiao H., Goddard W. A. I. Free-Energy Barriers and Reaction Mechanisms for the Electrochemical Reduction of CO on the Cu(100) Surface, Including Multiple Layers of Explicit Solvent at pH 0. // Journal of Physical Chemistry Letters. 2015. Vol. 6. No. 23. pp. 4767-4773.
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Cheng T., Xiao H., Goddard W. A. I. Free-Energy Barriers and Reaction Mechanisms for the Electrochemical Reduction of CO on the Cu(100) Surface, Including Multiple Layers of Explicit Solvent at pH 0. // Journal of Physical Chemistry Letters. 2015. Vol. 6. No. 23. pp. 4767-4773.
RIS |
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RIS Copy
TY - JOUR
DO - 10.1021/acs.jpclett.5b02247
UR - https://doi.org/10.1021/acs.jpclett.5b02247
TI - Free-Energy Barriers and Reaction Mechanisms for the Electrochemical Reduction of CO on the Cu(100) Surface, Including Multiple Layers of Explicit Solvent at pH 0.
T2 - Journal of Physical Chemistry Letters
AU - Cheng, Tao
AU - Xiao, Hai
AU - Goddard, William A. III
PY - 2015
DA - 2015/11/17
PB - American Chemical Society (ACS)
SP - 4767-4773
IS - 23
VL - 6
SN - 1948-7185
ER -
BibTex |
Cite this
BibTex Copy
@article{2015_Cheng,
author = {Tao Cheng and Hai Xiao and William A. III Goddard},
title = {Free-Energy Barriers and Reaction Mechanisms for the Electrochemical Reduction of CO on the Cu(100) Surface, Including Multiple Layers of Explicit Solvent at pH 0.},
journal = {Journal of Physical Chemistry Letters},
year = {2015},
volume = {6},
publisher = {American Chemical Society (ACS)},
month = {nov},
url = {https://doi.org/10.1021/acs.jpclett.5b02247},
number = {23},
pages = {4767--4773},
doi = {10.1021/acs.jpclett.5b02247}
}
MLA
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MLA Copy
Cheng, Tao, et al. “Free-Energy Barriers and Reaction Mechanisms for the Electrochemical Reduction of CO on the Cu(100) Surface, Including Multiple Layers of Explicit Solvent at pH 0..” Journal of Physical Chemistry Letters, vol. 6, no. 23, Nov. 2015, pp. 4767-4773. https://doi.org/10.1021/acs.jpclett.5b02247.
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