volume 18 issue 10 pages 6521-6529

New Universal Type of Interface in the Magnetic Insulator/Topological Insulator Heterostructures

Sergey V. Eremeev 1, 2, 3, 4
Mikhail M. Otrokov 2, 3, 5, 6
E.V. Chulkov 2, 3, 4, 5
Publication typeJournal Article
Publication date2018-09-27
scimago Q1
wos Q1
SJR2.967
CiteScore14.9
Impact factor9.1
ISSN15306984, 15306992
General Chemistry
Condensed Matter Physics
General Materials Science
Mechanical Engineering
Bioengineering
Abstract
Magnetic proximity effect at the interface between magnetic and topological insulators (MIs and TIs) is considered to have great potential in spintronics as, in principle, it allows realizing the quantum anomalous Hall and topological magneto-electric effects (QAHE and TME). Although an out-of-plane magnetization induced in a TI by the proximity effect was successfully probed in experiments, first-principles calculations reveal that a strong electrostatic potential mismatch at abrupt MI/TI interfaces creates harmful trivial states rendering both the QAHE and TME unfeasible in practice. Here on the basis of recent progress in formation of planar self-assembled single layer MI/TI heterostructure (T. Hirahara et al. Nano Lett. 2017 , 17 , 3493 - 3500 ), we propose a conceptually new type of the MI/TI interfaces by means of density functional theory calculations. By considering MnSe/Bi2Se3, MnTe/Bi2Te3, and EuS/Bi2Se3 we demonstrate that, instead of a sharp MI/TI interface clearly separating the two subsystems, it is energetically far more favorable to form a built-in interface via insertion of the MI film inside the TI's surface quintuple layer (e.g., Se-Bi-Se-[MnSe]-Bi-Se) where it forms a bulk-like MI structure. This results in a smooth MI-to-TI connection that yields the interface electronic structure essentially free of trivial states. Our findings open a new direction in studies of the MI/TI interfaces and restore their potential for the QAHE and TME observation.
Found 
Found 

Top-30

Journals

2
4
6
8
10
Physical Review B
10 publications, 16.39%
Physical Review Materials
6 publications, 9.84%
npj Quantum Materials
3 publications, 4.92%
Journal of Alloys and Compounds
2 publications, 3.28%
Applied Physics Letters
2 publications, 3.28%
Physical Review Letters
2 publications, 3.28%
Nature Communications
2 publications, 3.28%
2D Materials
2 publications, 3.28%
Nano Letters
2 publications, 3.28%
Journal of Materials Chemistry C
2 publications, 3.28%
Russian Journal of Inorganic Chemistry
2 publications, 3.28%
Nature
1 publication, 1.64%
Scientific Reports
1 publication, 1.64%
Journal of Physical Chemistry Letters
1 publication, 1.64%
Materials
1 publication, 1.64%
Condensed Matter
1 publication, 1.64%
Coatings
1 publication, 1.64%
Nature Materials
1 publication, 1.64%
Applied Surface Science
1 publication, 1.64%
Nano Research
1 publication, 1.64%
Journal of Physics: Conference Series
1 publication, 1.64%
Advanced Materials
1 publication, 1.64%
Physica Status Solidi - Rapid Research Letters
1 publication, 1.64%
Chemistry of Materials
1 publication, 1.64%
Acta Physica Sinica
1 publication, 1.64%
Proceedings of the National Academy of Sciences of the United States of America
1 publication, 1.64%
Materials Today Electronics
1 publication, 1.64%
Nanoscale
1 publication, 1.64%
National Science Review
1 publication, 1.64%
2
4
6
8
10

Publishers

2
4
6
8
10
12
14
16
18
American Physical Society (APS)
18 publications, 29.51%
Springer Nature
10 publications, 16.39%
Elsevier
5 publications, 8.2%
American Chemical Society (ACS)
4 publications, 6.56%
MDPI
4 publications, 6.56%
Wiley
4 publications, 6.56%
IOP Publishing
3 publications, 4.92%
Royal Society of Chemistry (RSC)
3 publications, 4.92%
Pleiades Publishing
3 publications, 4.92%
AIP Publishing
2 publications, 3.28%
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
1 publication, 1.64%
Proceedings of the National Academy of Sciences (PNAS)
1 publication, 1.64%
Oxford University Press
1 publication, 1.64%
Institute of Electrical and Electronics Engineers (IEEE)
1 publication, 1.64%
Science in China Press
1 publication, 1.64%
2
4
6
8
10
12
14
16
18
  • We do not take into account publications without a DOI.
  • Statistics recalculated weekly.

Are you a researcher?

Create a profile to get free access to personal recommendations for colleagues and new articles.
Metrics
61
Share
Cite this
GOST |
Cite this
GOST Copy
Eremeev S. V. et al. New Universal Type of Interface in the Magnetic Insulator/Topological Insulator Heterostructures // Nano Letters. 2018. Vol. 18. No. 10. pp. 6521-6529.
GOST all authors (up to 50) Copy
Eremeev S. V., Otrokov M. M., Chulkov E. New Universal Type of Interface in the Magnetic Insulator/Topological Insulator Heterostructures // Nano Letters. 2018. Vol. 18. No. 10. pp. 6521-6529.
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.1021/acs.nanolett.8b03057
UR - https://doi.org/10.1021/acs.nanolett.8b03057
TI - New Universal Type of Interface in the Magnetic Insulator/Topological Insulator Heterostructures
T2 - Nano Letters
AU - Eremeev, Sergey V.
AU - Otrokov, Mikhail M.
AU - Chulkov, E.V.
PY - 2018
DA - 2018/09/27
PB - American Chemical Society (ACS)
SP - 6521-6529
IS - 10
VL - 18
PMID - 30260648
SN - 1530-6984
SN - 1530-6992
ER -
BibTex |
Cite this
BibTex (up to 50 authors) Copy
@article{2018_Eremeev,
author = {Sergey V. Eremeev and Mikhail M. Otrokov and E.V. Chulkov},
title = {New Universal Type of Interface in the Magnetic Insulator/Topological Insulator Heterostructures},
journal = {Nano Letters},
year = {2018},
volume = {18},
publisher = {American Chemical Society (ACS)},
month = {sep},
url = {https://doi.org/10.1021/acs.nanolett.8b03057},
number = {10},
pages = {6521--6529},
doi = {10.1021/acs.nanolett.8b03057}
}
MLA
Cite this
MLA Copy
Eremeev, Sergey V., et al. “New Universal Type of Interface in the Magnetic Insulator/Topological Insulator Heterostructures.” Nano Letters, vol. 18, no. 10, Sep. 2018, pp. 6521-6529. https://doi.org/10.1021/acs.nanolett.8b03057.