volume 128 issue 50 pages 16024-16025

A Stable Schrock-Type Hafnium−Silylene Complex

Publication typeJournal Article
Publication date2006-11-30
scimago Q1
wos Q1
SJR5.554
CiteScore22.5
Impact factor15.6
ISSN00027863, 15205126
PubMed ID:  17165741
General Chemistry
Catalysis
Biochemistry
Colloid and Surface Chemistry
Abstract
The first stable hafnium-silylene complex, (eta-C5H4Et)2(PMe3)Hf=Si(SiMetBu2)2 (6) was obtained in the form of the phosphine adduct as red crystals by the coupling reaction of 1,1-dilithiosilane (1) with 0.9 equiv of (eta-C5H4Et)2HfCl2 in dry toluene at -50 degrees C, followed by treatment with an excess of PMe3 at -50 degrees C. In the 29Si NMR spectrum of 6, the signal from the silylene ligand is shifted greatly downfield at 295.4 ppm, with a JSiP coupling constant of 15.0 Hz. X-ray crystallographic analysis of 6 revealed that the Si-Hf bond length (2.6515(9) A) is about 5% shorter than typical Si-Hf single bonds, obviously indicating the double-bond character between the silicon and hafnium atoms. The compound 6 was found to be a Schrock-type silylene complex, a conclusion that was supported by the natural population analysis (NPA) charge distribution for the model complex, (eta-C5H4Et)2(PMe3)Hf=Si(SiMe3)2 (8), showing a negative charge on the silicon atom (-0.34).
Found 
Found 

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Nakata N., Fujita T., Sekiguchi A. A Stable Schrock-Type Hafnium−Silylene Complex // Journal of the American Chemical Society. 2006. Vol. 128. No. 50. pp. 16024-16025.
GOST all authors (up to 50) Copy
Nakata N., Fujita T., Sekiguchi A. A Stable Schrock-Type Hafnium−Silylene Complex // Journal of the American Chemical Society. 2006. Vol. 128. No. 50. pp. 16024-16025.
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.1021/ja067251d
UR - https://doi.org/10.1021/ja067251d
TI - A Stable Schrock-Type Hafnium−Silylene Complex
T2 - Journal of the American Chemical Society
AU - Nakata, Norio
AU - Fujita, Toshiyuki
AU - Sekiguchi, Akira
PY - 2006
DA - 2006/11/30
PB - American Chemical Society (ACS)
SP - 16024-16025
IS - 50
VL - 128
PMID - 17165741
SN - 0002-7863
SN - 1520-5126
ER -
BibTex |
Cite this
BibTex (up to 50 authors) Copy
@article{2006_Nakata,
author = {Norio Nakata and Toshiyuki Fujita and Akira Sekiguchi},
title = {A Stable Schrock-Type Hafnium−Silylene Complex},
journal = {Journal of the American Chemical Society},
year = {2006},
volume = {128},
publisher = {American Chemical Society (ACS)},
month = {nov},
url = {https://doi.org/10.1021/ja067251d},
number = {50},
pages = {16024--16025},
doi = {10.1021/ja067251d}
}
MLA
Cite this
MLA Copy
Nakata, Norio, et al. “A Stable Schrock-Type Hafnium−Silylene Complex.” Journal of the American Chemical Society, vol. 128, no. 50, Nov. 2006, pp. 16024-16025. https://doi.org/10.1021/ja067251d.