ArF and KrF Laser-Induced Gas-Phase Photolysis of Selenophene and Tellurophene: Extrusion of Te and Se and Intramolecular 1,3-H Shift Competing with β-C−C Cleavage in C4H4 Residue
Тип публикации: Journal Article
Дата публикации: 2000-04-07
scimago Q2
wos Q1
БС1
SJR: 0.737
CiteScore: 6.1
Impact factor: 3.6
ISSN: 00223263, 15206904
PubMed ID:
10808452
Organic Chemistry
Краткое описание
ArF (193 nm) and KrF (248 nm) laser-induced photolysis of gaseous selenophene and tellurophene (C4H4M, M=Se and Te) has been examined. It is shown that, unlike thiophene and furan, selenophene and tellurophene cleave both M-C bonds and yield the elemental heteroatom (Se, Te), 1-buten-3-yne, and ethyne. The proposed mechanism involves an intermediate .HC=CH-CH=CH. diradical that decomposes via two competitive pathways, namely, 1,3-H shift to 1-buten-3-yne and beta-cleavage to two molecules of ethyne. It is shown that the relative importance of the channels depends both on the energy of the photon and on the heteroatom. Specifically, the 1,3-H shift/beta-cleavage ratios are 2.3 (193 nm, M=Se), 3.6 (248 nm, M=Se), 1.4 (193 nm, M=Te), and 10.5 (248 nm, M=Te). The inertness of the Te residuum and the high preference for the 1,3-H shift in KrF laser photolysis of tellurophene suggest that this photolysis can serve as a source of the C4H4 diradical for mechanistic studies.
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Pola J., Ouchi A. ArF and KrF Laser-Induced Gas-Phase Photolysis of Selenophene and Tellurophene: Extrusion of Te and Se and Intramolecular 1,3-H Shift Competing with β-C−C Cleavage in C4H4 Residue // Journal of Organic Chemistry. 2000. Vol. 65. No. 9. pp. 2759-2762.
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Pola J., Ouchi A. ArF and KrF Laser-Induced Gas-Phase Photolysis of Selenophene and Tellurophene: Extrusion of Te and Se and Intramolecular 1,3-H Shift Competing with β-C−C Cleavage in C4H4 Residue // Journal of Organic Chemistry. 2000. Vol. 65. No. 9. pp. 2759-2762.
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TY - JOUR
DO - 10.1021/jo991867m
UR - https://pubs.acs.org/doi/10.1021/jo991867m
TI - ArF and KrF Laser-Induced Gas-Phase Photolysis of Selenophene and Tellurophene: Extrusion of Te and Se and Intramolecular 1,3-H Shift Competing with β-C−C Cleavage in C4H4 Residue
T2 - Journal of Organic Chemistry
AU - Pola, Josef
AU - Ouchi, Akihiko
PY - 2000
DA - 2000/04/07
PB - American Chemical Society (ACS)
SP - 2759-2762
IS - 9
VL - 65
PMID - 10808452
SN - 0022-3263
SN - 1520-6904
ER -
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@article{2000_Pola,
author = {Josef Pola and Akihiko Ouchi},
title = {ArF and KrF Laser-Induced Gas-Phase Photolysis of Selenophene and Tellurophene: Extrusion of Te and Se and Intramolecular 1,3-H Shift Competing with β-C−C Cleavage in C4H4 Residue},
journal = {Journal of Organic Chemistry},
year = {2000},
volume = {65},
publisher = {American Chemical Society (ACS)},
month = {apr},
url = {https://pubs.acs.org/doi/10.1021/jo991867m},
number = {9},
pages = {2759--2762},
doi = {10.1021/jo991867m}
}
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Pola, Josef, and Akihiko Ouchi. “ArF and KrF Laser-Induced Gas-Phase Photolysis of Selenophene and Tellurophene: Extrusion of Te and Se and Intramolecular 1,3-H Shift Competing with β-C−C Cleavage in C4H4 Residue.” Journal of Organic Chemistry, vol. 65, no. 9, Apr. 2000, pp. 2759-2762. https://pubs.acs.org/doi/10.1021/jo991867m.