Open Access
Nanoscale Advances, volume 4, issue 4, pages 1080-1087
Quantum dot photolithography using a quantum dot photoresist composed of an organic–inorganic hybrid coating layer
Publication type: Journal Article
Publication date: 2022-01-12
PubMed ID:
36131767
General Chemistry
Atomic and Molecular Physics, and Optics
General Materials Science
Bioengineering
General Engineering
Abstract
We reports a QD photolithography technique using a custom-developed QD photoresist made of an organic–inorganic hybrid coating layer.
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