Open Access
Open access
Nanoscale Advances, volume 4, issue 4, pages 1080-1087

Quantum dot photolithography using a quantum dot photoresist composed of an organic–inorganic hybrid coating layer

Publication typeJournal Article
Publication date2022-01-12
scimago Q1
SJR0.953
CiteScore8.0
Impact factor4.6
ISSN25160230
PubMed ID:  36131767
General Chemistry
Atomic and Molecular Physics, and Optics
General Materials Science
Bioengineering
General Engineering
Abstract

We reports a QD photolithography technique using a custom-developed QD photoresist made of an organic–inorganic hybrid coating layer.

Found 
Found 

Top-30

Journals

1
2
1
2

Publishers

1
2
3
4
5
6
1
2
3
4
5
6
  • We do not take into account publications without a DOI.
  • Statistics recalculated only for publications connected to researchers, organizations and labs registered on the platform.
  • Statistics recalculated weekly.

Are you a researcher?

Create a profile to get free access to personal recommendations for colleagues and new articles.
Share
Cite this
GOST | RIS | BibTex | MLA
Found error?