Nanoscale, volume 8, issue 41, pages 17809-17814

Self-adjusted all-dielectric metasurfaces for deep ultraviolet femtosecond pulse generation

Publication typeJournal Article
Publication date2016-09-14
Journal: Nanoscale
Quartile SCImago
Q1
Quartile WOS
Q1
Impact factor6.7
ISSN20403364, 20403372
General Materials Science
Abstract
The advantage of metasurfaces and nanostructures with a high nonlinear response is that they do not require phase matching, and the generated pulses are short in the time domain without additional pulse compression. However, the fabrication of large-scale planar structures by lithography-based methods is expensive, time consuming, and requires complicated preliminary simulations to obtain the most optimized geometry. Here, we propose a novel strategy for the self-assembled fabrication of large-scale resonant metasurfaces, where incident femtosecond laser pulses adjust the initial silicon films via specific surface deformation to be as resonant as possible for a given wavelength. The self-adjusting approach eliminates the necessity of multistep lithography and designing, because interference between the incident and the scattered parts of each laser pulse "imprints" resonant field distribution within the film. The self-adjusted metasurfaces demonstrate a high damage threshold (≈1012 W cm-2) and efficient frequency conversion from near-IR to deep UV. The conversion efficiency is up to 30-fold higher compared with nonresonant smooth Si films. The resulting metasurfaces allow for the generation of UV femtosecond laser pulses at a wavelength of 270 nm with a high peak and average power (≈105 W and ≈1.5 μW, respectively). The results pave the way to the creation of ultrathin nonlinear metadevices working at high laser intensities for efficient deep UV generation at the nanoscale.

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Makarov S. V. et al. Self-adjusted all-dielectric metasurfaces for deep ultraviolet femtosecond pulse generation // Nanoscale. 2016. Vol. 8. No. 41. pp. 17809-17814.
GOST all authors (up to 50) Copy
Makarov S. V., Tsypkin A. N., Voytova T. A., Milichko V. A., Mukhin I. S., YULIN A., Putilin S. E., Baranov M. A., Krasnok A. E., Morozov I., Belov P. A. Self-adjusted all-dielectric metasurfaces for deep ultraviolet femtosecond pulse generation // Nanoscale. 2016. Vol. 8. No. 41. pp. 17809-17814.
RIS |
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RIS Copy
TY - JOUR
DO - 10.1039/c6nr04860a
UR - https://doi.org/10.1039%2Fc6nr04860a
TI - Self-adjusted all-dielectric metasurfaces for deep ultraviolet femtosecond pulse generation
T2 - Nanoscale
AU - Voytova, T A
AU - YULIN, A.V.
AU - Baranov, M. A.
AU - Makarov, Sergey V.
AU - Tsypkin, Anton N.
AU - Milichko, Valentin A.
AU - Mukhin, Ivan S.
AU - Putilin, Sergey E.
AU - Krasnok, A E
AU - Morozov, Ivan A.
AU - Belov, Pavel A.
PY - 2016
DA - 2016/09/14 00:00:00
PB - Royal Society of Chemistry (RSC)
SP - 17809-17814
IS - 41
VL - 8
SN - 2040-3364
SN - 2040-3372
ER -
BibTex |
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BibTex Copy
@article{2016_Makarov
author = {T A Voytova and A.V. YULIN and M. A. Baranov and Sergey V. Makarov and Anton N. Tsypkin and Valentin A. Milichko and Ivan S. Mukhin and Sergey E. Putilin and A E Krasnok and Ivan A. Morozov and Pavel A. Belov},
title = {Self-adjusted all-dielectric metasurfaces for deep ultraviolet femtosecond pulse generation},
journal = {Nanoscale},
year = {2016},
volume = {8},
publisher = {Royal Society of Chemistry (RSC)},
month = {sep},
url = {https://doi.org/10.1039%2Fc6nr04860a},
number = {41},
pages = {17809--17814},
doi = {10.1039/c6nr04860a}
}
MLA
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MLA Copy
Makarov, Sergey V., et al. “Self-adjusted all-dielectric metasurfaces for deep ultraviolet femtosecond pulse generation.” Nanoscale, vol. 8, no. 41, Sep. 2016, pp. 17809-17814. https://doi.org/10.1039%2Fc6nr04860a.
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