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Electronics Letters, volume 36, issue 16, pages 1384

InAs-InGaAs quantum dot VCSELs on GaAs substrates emitting at 1.3 [micro sign]m

1
 
Dept. of Electr. & Comput. Eng., Air Force Inst. of Technol., Wright Patterson Afb, OH, USA
Publication typeJournal Article
Publication date2002-07-26
scimago Q3
wos Q4
SJR0.323
CiteScore2.7
Impact factor0.7
ISSN00135194, 1350911X
Electrical and Electronic Engineering
Abstract
Pulsed lasing at 1.3 /spl mu/m via the exciton ground state is demonstrated for vertical cavity surface emitting lasers containing three uncoupled sheets of InAs quantum dot active layers. The structures are grown directly on GaAs substrates and when fabricated include selectively oxidised AlO current apertures, intracavity metal contacts, and AlO/GaAs distributed Bragg reflectors. Experimental devices operate pulsed at room temperature with threshold currents below 2 mA and differential slope efficiencies above 40%.

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