X‐ray photoelectron spectroscopy of carbon nitride films deposited by graphite laser ablation in a nitrogen postdischarge
Тип публикации: Journal Article
Дата публикации: 1996-09-16
scimago Q1
wos Q2
БС1
SJR: 0.976
CiteScore: 6.4
Impact factor: 3.6
ISSN: 00036951, 10773118
Physics and Astronomy (miscellaneous)
Краткое описание
Carbon nitride thin films have been deposited on silicon substrates, using a newly developed surface wave discharge/pulsed laser deposition system. Nitrogen incorporation in the films is examined by x-ray photoelectron spectroscopy (XPS). It shows that interaction between the laser ablated carbon species and nitrogen atoms from the surface-wave N2 plasma enhances the incorporation of N in the carbon nitride layers, for example, up to 19% at a deposition pressure of 2 mTorr. Increasing the deposition temperature decreases nitrogen incorporation and changes the local chemical environment of nitrogen atoms.
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MLA
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ГОСТ
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Tabbal M. et al. X‐ray photoelectron spectroscopy of carbon nitride films deposited by graphite laser ablation in a nitrogen postdischarge // Applied Physics Letters. 1996. Vol. 69. No. 12. pp. 1698-1700.
ГОСТ со всеми авторами (до 50)
Скопировать
Tabbal M., Mérel P., Moisa S., Chaker M., Ricard A., Moisan M. X‐ray photoelectron spectroscopy of carbon nitride films deposited by graphite laser ablation in a nitrogen postdischarge // Applied Physics Letters. 1996. Vol. 69. No. 12. pp. 1698-1700.
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RIS
Скопировать
TY - JOUR
DO - 10.1063/1.118000
UR - https://doi.org/10.1063/1.118000
TI - X‐ray photoelectron spectroscopy of carbon nitride films deposited by graphite laser ablation in a nitrogen postdischarge
T2 - Applied Physics Letters
AU - Tabbal, Malek
AU - Mérel, Philippe
AU - Moisa, Simona
AU - Chaker, Mohamed
AU - Ricard, André
AU - Moisan, Michel
PY - 1996
DA - 1996/09/16
PB - AIP Publishing
SP - 1698-1700
IS - 12
VL - 69
SN - 0003-6951
SN - 1077-3118
ER -
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BibTex (до 50 авторов)
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@article{1996_Tabbal,
author = {Malek Tabbal and Philippe Mérel and Simona Moisa and Mohamed Chaker and André Ricard and Michel Moisan},
title = {X‐ray photoelectron spectroscopy of carbon nitride films deposited by graphite laser ablation in a nitrogen postdischarge},
journal = {Applied Physics Letters},
year = {1996},
volume = {69},
publisher = {AIP Publishing},
month = {sep},
url = {https://doi.org/10.1063/1.118000},
number = {12},
pages = {1698--1700},
doi = {10.1063/1.118000}
}
Цитировать
MLA
Скопировать
Tabbal, Malek, et al. “X‐ray photoelectron spectroscopy of carbon nitride films deposited by graphite laser ablation in a nitrogen postdischarge.” Applied Physics Letters, vol. 69, no. 12, Sep. 1996, pp. 1698-1700. https://doi.org/10.1063/1.118000.