	2 4 6 8 10 12
Russian Physics Journal	Russian Physics Journal, 11, 12.09% Russian Physics Journal 11 publications, 12.09%
Physics of Plasmas	Physics of Plasmas, 9, 9.89% Physics of Plasmas 9 publications, 9.89%
Vacuum	Vacuum, 7, 7.69% Vacuum 7 publications, 7.69%
IEEE Transactions on Electron Devices	IEEE Transactions on Electron Devices, 5, 5.49% IEEE Transactions on Electron Devices 5 publications, 5.49%
IEEE Transactions on Plasma Science	IEEE Transactions on Plasma Science, 5, 5.49% IEEE Transactions on Plasma Science 5 publications, 5.49%
Journal Physics D: Applied Physics	Journal Physics D: Applied Physics, 4, 4.4% Journal Physics D: Applied Physics 4 publications, 4.4%
Plasma Sources Science and Technology	Plasma Sources Science and Technology, 4, 4.4% Plasma Sources Science and Technology 4 publications, 4.4%
Journal of Physics: Conference Series	Journal of Physics: Conference Series, 3, 3.3% Journal of Physics: Conference Series 3 publications, 3.3%
High Energy Chemistry	High Energy Chemistry, 3, 3.3% High Energy Chemistry 3 publications, 3.3%
Plasma Science and Technology	Plasma Science and Technology, 2, 2.2% Plasma Science and Technology 2 publications, 2.2%
Review of Scientific Instruments	Review of Scientific Instruments, 2, 2.2% Review of Scientific Instruments 2 publications, 2.2%
Coatings	Coatings, 2, 2.2% Coatings 2 publications, 2.2%
Bulletin of the Russian Academy of Sciences: Physics	Bulletin of the Russian Academy of Sciences: Physics, 2, 2.2% Bulletin of the Russian Academy of Sciences: Physics 2 publications, 2.2%
Journal of Instrumentation	Journal of Instrumentation, 2, 2.2% Journal of Instrumentation 2 publications, 2.2%
AIP Advances	AIP Advances, 1, 1.1% AIP Advances 1 publication, 1.1%
Journal of Applied Physics	Journal of Applied Physics, 1, 1.1% Journal of Applied Physics 1 publication, 1.1%
High Voltage	High Voltage, 1, 1.1% High Voltage 1 publication, 1.1%
Machines	Machines, 1, 1.1% Machines 1 publication, 1.1%
Indian Journal of Physics	Indian Journal of Physics, 1, 1.1% Indian Journal of Physics 1 publication, 1.1%
Plasma Chemistry and Plasma Processing	Plasma Chemistry and Plasma Processing, 1, 1.1% Plasma Chemistry and Plasma Processing 1 publication, 1.1%
High Temperature	High Temperature, 1, 1.1% High Temperature 1 publication, 1.1%
Journal of Physics Communications	Journal of Physics Communications, 1, 1.1% Journal of Physics Communications 1 publication, 1.1%
Chinese Physics B	Chinese Physics B, 1, 1.1% Chinese Physics B 1 publication, 1.1%
Thin Solid Films	Thin Solid Films, 1, 1.1% Thin Solid Films 1 publication, 1.1%
Surface and Coatings Technology	Surface and Coatings Technology, 1, 1.1% Surface and Coatings Technology 1 publication, 1.1%
Plasma Processes and Polymers	Plasma Processes and Polymers, 1, 1.1% Plasma Processes and Polymers 1 publication, 1.1%
Advanced Materials Technologies	Advanced Materials Technologies, 1, 1.1% Advanced Materials Technologies 1 publication, 1.1%
IEEE Transactions on Power Electronics	IEEE Transactions on Power Electronics, 1, 1.1% IEEE Transactions on Power Electronics 1 publication, 1.1%
Acta Physica Sinica	Acta Physica Sinica, 1, 1.1% Acta Physica Sinica 1 publication, 1.1%
	2 4 6 8 10 12

Publishers

	2 4 6 8 10 12 14 16 18 20
Institute of Electrical and Electronics Engineers (IEEE)	Institute of Electrical and Electronics Engineers (IEEE), 19, 20.88% Institute of Electrical and Electronics Engineers (IEEE) 19 publications, 20.88%
IOP Publishing	IOP Publishing, 18, 19.78% IOP Publishing 18 publications, 19.78%
AIP Publishing	AIP Publishing, 15, 16.48% AIP Publishing 15 publications, 16.48%
Springer Nature	Springer Nature, 13, 14.29% Springer Nature 13 publications, 14.29%
Elsevier	Elsevier, 12, 13.19% Elsevier 12 publications, 13.19%
Pleiades Publishing	Pleiades Publishing, 7, 7.69% Pleiades Publishing 7 publications, 7.69%
MDPI	MDPI, 3, 3.3% MDPI 3 publications, 3.3%
Wiley	Wiley, 2, 2.2% Wiley 2 publications, 2.2%
Institution of Engineering and Technology (IET)	Institution of Engineering and Technology (IET), 1, 1.1% Institution of Engineering and Technology (IET) 1 publication, 1.1%
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences	Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences, 1, 1.1% Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences 1 publication, 1.1%
	2 4 6 8 10 12 14 16 18 20

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GOST Copy

Korolev Y., Koval N. N. Low-pressure discharges with hollow cathode and hollow anode and their applications // Journal Physics D: Applied Physics. 2018. Vol. 51. No. 32. p. 323001.

GOST all authors (up to 50) Copy

Korolev Y., Koval N. N. Low-pressure discharges with hollow cathode and hollow anode and their applications // Journal Physics D: Applied Physics. 2018. Vol. 51. No. 32. p. 323001.

RIS |

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RIS Copy

TY - JOUR

DO - 10.1088/1361-6463/aacf10

UR - https://iopscience.iop.org/article/10.1088/1361-6463/aacf10

TI - Low-pressure discharges with hollow cathode and hollow anode and their applications

T2 - Journal Physics D: Applied Physics

AU - Korolev, Yu.D.

AU - Koval, N N

PY - 2018

DA - 2018/07/13

PB - IOP Publishing

SP - 323001

IS - 32

VL - 51

SN - 0022-3727

SN - 1361-6463

ER -

BibTex |

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@article{2018_Korolev,

author = {Yu.D. Korolev and N N Koval},

title = {Low-pressure discharges with hollow cathode and hollow anode and their applications},

journal = {Journal Physics D: Applied Physics},

year = {2018},

volume = {51},

publisher = {IOP Publishing},

month = {jul},

url = {https://iopscience.iop.org/article/10.1088/1361-6463/aacf10},

number = {32},

pages = {323001},

doi = {10.1088/1361-6463/aacf10}

}

MLA

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MLA Copy

Korolev, Yu.D., and N N Koval. “Low-pressure discharges with hollow cathode and hollow anode and their applications.” Journal Physics D: Applied Physics, vol. 51, no. 32, Jul. 2018, p. 323001. https://iopscience.iop.org/article/10.1088/1361-6463/aacf10.