Nanotechnology, volume 31, issue 12, pages 125705

Non-chemical fluorination of hexagonal boron nitride by high-energy ion irradiation

Entani Shiro 1
Popov Zakhar 3, 4
TAKIZAWA Masaru 5
Watanabe Hideo 7
Li Songtian 8
Naramoto Hiroshi 8
Sorokin Pavel B. 2, 3
4
 
RUSSIAN ACADEMY OF SCIENCES
5
 
RITSUMEIKAN University
6
 
Institute for Materials Research, Tohoku University, Aoba-ku, Sendai 980-8570, Japan
7
 
Research Institute for Applied Mechanics Kyushu University Kasuga Fukuoka 816‐8580 Japan
Publication typeJournal Article
Publication date2020-01-08
Journal: Nanotechnology
Quartile SCImago
Q1
Quartile WOS
Q2
Impact factor3.5
ISSN09574484, 13616528
General Chemistry
General Materials Science
Electrical and Electronic Engineering
Mechanical Engineering
Bioengineering
Mechanics of Materials
Abstract
Two-dimensional materials such as hexagonal boron nitride (h-BN) and graphene have attracted wide attention in nanoelectronics and spintronics. Since their electronic characteristics are strongly affected by the local atomic structure, the heteroatom doping could allow us to tailor the electronic and physical properties of two-dimensional materials. In this study, a non-chemical method of heteroatom doping into h-BN under high-energy ion irradiation was demonstrated for the LiF/h-BN/Cu heterostructure. Spectroscopic analysis of chemical states on the relevant atoms revealed that 6% ± 2% fluorinated h-BN is obtained by the irradiation of 2.4 MeV Cu2+ ions with the fluence up to 1014 ions cm-2. It was shown that the high-energy ion irradiation leads to a single-sided fluorination of h-BN by the formation of the fluorinated sp 3-hybridized BN.

Citations by journals

1
Nanomaterials
Nanomaterials, 1, 20%
Nanomaterials
1 publication, 20%
Chemical Engineering Journal
Chemical Engineering Journal, 1, 20%
Chemical Engineering Journal
1 publication, 20%
Nanotechnology
Nanotechnology, 1, 20%
Nanotechnology
1 publication, 20%
Physical Chemistry Chemical Physics
Physical Chemistry Chemical Physics, 1, 20%
Physical Chemistry Chemical Physics
1 publication, 20%
Inorganics
Inorganics, 1, 20%
Inorganics
1 publication, 20%
1

Citations by publishers

1
2
Multidisciplinary Digital Publishing Institute (MDPI)
Multidisciplinary Digital Publishing Institute (MDPI), 2, 40%
Multidisciplinary Digital Publishing Institute (MDPI)
2 publications, 40%
Elsevier
Elsevier, 1, 20%
Elsevier
1 publication, 20%
IOP Publishing
IOP Publishing, 1, 20%
IOP Publishing
1 publication, 20%
Royal Society of Chemistry (RSC)
Royal Society of Chemistry (RSC), 1, 20%
Royal Society of Chemistry (RSC)
1 publication, 20%
1
2
  • We do not take into account publications that without a DOI.
  • Statistics recalculated only for publications connected to researchers, organizations and labs registered on the platform.
  • Statistics recalculated weekly.
Metrics
Share
Cite this
GOST |
Cite this
GOST Copy
Entani S. et al. Non-chemical fluorination of hexagonal boron nitride by high-energy ion irradiation // Nanotechnology. 2020. Vol. 31. No. 12. p. 125705.
GOST all authors (up to 50) Copy
Entani S., Larionov K. V., Popov Z., TAKIZAWA M., MIZUGUCHI M., Watanabe H., Li S., Naramoto H., Sorokin P. B., Sakai S. Non-chemical fluorination of hexagonal boron nitride by high-energy ion irradiation // Nanotechnology. 2020. Vol. 31. No. 12. p. 125705.
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.1088/1361-6528/ab5bcc
UR - https://doi.org/10.1088%2F1361-6528%2Fab5bcc
TI - Non-chemical fluorination of hexagonal boron nitride by high-energy ion irradiation
T2 - Nanotechnology
AU - Entani, Shiro
AU - Larionov, Konstantin V.
AU - Popov, Zakhar
AU - TAKIZAWA, Masaru
AU - MIZUGUCHI, Masanobu
AU - Watanabe, Hideo
AU - Li, Songtian
AU - Naramoto, Hiroshi
AU - Sorokin, Pavel B.
AU - Sakai, Seiji
PY - 2020
DA - 2020/01/08 00:00:00
PB - IOP Publishing
SP - 125705
IS - 12
VL - 31
SN - 0957-4484
SN - 1361-6528
ER -
BibTex |
Cite this
BibTex Copy
@article{2020_Entani,
author = {Shiro Entani and Konstantin V. Larionov and Zakhar Popov and Masaru TAKIZAWA and Masanobu MIZUGUCHI and Hideo Watanabe and Songtian Li and Hiroshi Naramoto and Pavel B. Sorokin and Seiji Sakai},
title = {Non-chemical fluorination of hexagonal boron nitride by high-energy ion irradiation},
journal = {Nanotechnology},
year = {2020},
volume = {31},
publisher = {IOP Publishing},
month = {jan},
url = {https://doi.org/10.1088%2F1361-6528%2Fab5bcc},
number = {12},
pages = {125705},
doi = {10.1088/1361-6528/ab5bcc}
}
MLA
Cite this
MLA Copy
Entani, Shiro, et al. “Non-chemical fluorination of hexagonal boron nitride by high-energy ion irradiation.” Nanotechnology, vol. 31, no. 12, Jan. 2020, p. 125705. https://doi.org/10.1088%2F1361-6528%2Fab5bcc.
Found error?