том 49 издание 20 страницы 14251-14269

Ab initiomolecular-dynamics simulation of the liquid-metal–amorphous-semiconductor transition in germanium

Тип публикацииJournal Article
Дата публикации1994-05-15
scimago Q1
wos Q2
БС1
SJR1.345
CiteScore6.3
Impact factor3.7
ISSN24699950, 24699969, 10980121, 1550235X
Краткое описание
We present ab initio quantum-mechanical molecular-dynamics simulations of the liquid-metal--amorphous-semiconductor transition in Ge. Our simulations are based on (a) finite-temperature density-functional theory of the one-electron states, (b) exact energy minimization and hence calculation of the exact Hellmann-Feynman forces after each molecular-dynamics step using preconditioned conjugate-gradient techniques, (c) accurate nonlocal pseudopotentials, and (d) Nos\'e dynamics for generating a canonical ensemble. This method gives perfect control of the adiabaticity of the electron-ion ensemble and allows us to perform simulations over more than 30 ps. The computer-generated ensemble describes the structural, dynamic, and electronic properties of liquid and amorphous Ge in very good agreement with experiment. The simulation allows us to study in detail the changes in the structure-property relationship through the metal-semiconductor transition. We report a detailed analysis of the local structural properties and their changes induced by an annealing process. The geometrical, bonding, and spectral properties of defects in the disordered tetrahedral network are investigated and compared with experiment.
Найдено 
Для доступа к списку цитирований публикации необходимо авторизоваться.
Для доступа к списку профилей, цитирующих публикацию, необходимо авторизоваться.

Топ-30

Журналы

200
400
600
800
1000
1200
1400
1600
1800
Physical Review B
1703 публикации, 8.12%
Journal of Physical Chemistry C
1587 публикаций, 7.56%
Physical Chemistry Chemical Physics
804 публикации, 3.83%
Journal of Chemical Physics
483 публикации, 2.3%
Applied Surface Science
423 публикации, 2.02%
Journal of Physics Condensed Matter
359 публикаций, 1.71%
ACS Catalysis
355 публикаций, 1.69%
Journal of Applied Physics
343 публикации, 1.63%
Surface Science
338 публикаций, 1.61%
Chemistry of Materials
335 публикаций, 1.6%
Journal of Materials Chemistry A
331 публикация, 1.58%
Computational Materials Science
295 публикаций, 1.41%
ACS applied materials & interfaces
288 публикаций, 1.37%
Nature Communications
278 публикаций, 1.32%
Journal of the American Chemical Society
255 публикаций, 1.22%
Applied Physics Letters
254 публикации, 1.21%
Journal of Alloys and Compounds
241 публикация, 1.15%
Physical Review Letters
225 публикаций, 1.07%
Physical Review Materials
220 публикаций, 1.05%
Inorganic Chemistry
201 публикация, 0.96%
Journal of Catalysis
201 публикация, 0.96%
Chemical Engineering Journal
191 публикация, 0.91%
Journal of Physical Chemistry Letters
184 публикации, 0.88%
RSC Advances
181 публикация, 0.86%
Acta Materialia
181 публикация, 0.86%
Nanoscale
174 публикации, 0.83%
International Journal of Hydrogen Energy
158 публикаций, 0.75%
Applied Catalysis B: Environmental
153 публикации, 0.73%
ACS Nano
144 публикации, 0.69%
200
400
600
800
1000
1200
1400
1600
1800

Издатели

1000
2000
3000
4000
5000
6000
Elsevier
5437 публикаций, 25.91%
American Chemical Society (ACS)
4362 публикации, 20.79%
American Physical Society (APS)
2280 публикаций, 10.87%
Royal Society of Chemistry (RSC)
2230 публикаций, 10.63%
Wiley
1588 публикаций, 7.57%
Springer Nature
1477 публикаций, 7.04%
AIP Publishing
1217 публикаций, 5.8%
IOP Publishing
869 публикаций, 4.14%
MDPI
333 публикации, 1.59%
Taylor & Francis
125 публикаций, 0.6%
Pleiades Publishing
115 публикаций, 0.55%
The Electrochemical Society
78 публикаций, 0.37%
American Association for the Advancement of Science (AAAS)
75 публикаций, 0.36%
Institute of Electrical and Electronics Engineers (IEEE)
64 публикации, 0.31%
Physical Society of Japan
49 публикаций, 0.23%
Japan Society of Applied Physics
44 публикации, 0.21%
World Scientific
43 публикации, 0.2%
Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
35 публикаций, 0.17%
American Vacuum Society
30 публикаций, 0.14%
Proceedings of the National Academy of Sciences (PNAS)
30 публикаций, 0.14%
Trans Tech Publications
29 публикаций, 0.14%
Walter de Gruyter
25 публикаций, 0.12%
Oxford University Press
24 публикации, 0.11%
Frontiers Media S.A.
22 публикации, 0.1%
International Union of Crystallography (IUCr)
21 публикация, 0.1%
Japan Institute of Metals
21 публикация, 0.1%
Cambridge University Press
20 публикаций, 0.1%
The Surface Science Society of Japan
16 публикаций, 0.08%
EDP Sciences
15 публикаций, 0.07%
1000
2000
3000
4000
5000
6000
  • Мы не учитываем публикации, у которых нет DOI.
  • Статистика публикаций обновляется еженедельно.

Вы ученый?

Создайте профиль, чтобы получать персональные рекомендации коллег, конференций и новых статей.
Метрики
21k
Поделиться
Цитировать
ГОСТ |
Цитировать
KRESSE G., Hafner J. Ab initiomolecular-dynamics simulation of the liquid-metal–amorphous-semiconductor transition in germanium // Physical Review B. 1994. Vol. 49. No. 20. pp. 14251-14269.
ГОСТ со всеми авторами (до 50) Скопировать
KRESSE G., Hafner J. Ab initiomolecular-dynamics simulation of the liquid-metal–amorphous-semiconductor transition in germanium // Physical Review B. 1994. Vol. 49. No. 20. pp. 14251-14269.
RIS |
Цитировать
TY - JOUR
DO - 10.1103/PhysRevB.49.14251
UR - https://doi.org/10.1103/PhysRevB.49.14251
TI - Ab initiomolecular-dynamics simulation of the liquid-metal–amorphous-semiconductor transition in germanium
T2 - Physical Review B
AU - KRESSE, G.
AU - Hafner, J
PY - 1994
DA - 1994/05/15
PB - American Physical Society (APS)
SP - 14251-14269
IS - 20
VL - 49
PMID - 10010505
SN - 2469-9950
SN - 2469-9969
SN - 1098-0121
SN - 1550-235X
ER -
BibTex |
Цитировать
BibTex (до 50 авторов) Скопировать
@article{1994_KRESSE,
author = {G. KRESSE and J Hafner},
title = {Ab initiomolecular-dynamics simulation of the liquid-metal–amorphous-semiconductor transition in germanium},
journal = {Physical Review B},
year = {1994},
volume = {49},
publisher = {American Physical Society (APS)},
month = {may},
url = {https://doi.org/10.1103/PhysRevB.49.14251},
number = {20},
pages = {14251--14269},
doi = {10.1103/PhysRevB.49.14251}
}
MLA
Цитировать
KRESSE, G., and J Hafner. “Ab initiomolecular-dynamics simulation of the liquid-metal–amorphous-semiconductor transition in germanium.” Physical Review B, vol. 49, no. 20, May. 1994, pp. 14251-14269. https://doi.org/10.1103/PhysRevB.49.14251.