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Void-free uniform gap filling between thick PECVD silicon nitride waveguides

A M Mumlyakov ¹

N Yu Dmitriev ²

M V Shibalov ¹

I V Trofimov ¹

I A Filippov ¹

A.A. Anikanov ¹

I. A. Bilenko ²

M. A. Tarkhov ¹

Institute of Nanotechnology of Microelectronics of Russian Academy of Science,Moscow,Russia,119991 |

Russian Quantum Center,Skolkovo,Russia,143026 |

Publication type: Proceedings Article

Publication date: 2024-07-01

DOI: 10.1109/iclo59702.2024.10624194

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