Ivan Andreevich Filippov

Graduated from Radio engineering department of Bauman Moscow State University in 2014. My diploma work was devoted to development and modeling microelectromechanical systems. In 2014 started to work as process engineer in Bauman University cleanroom in projects focused on Plasmonics, Quantum computer, MEMS and microfluidics. In 2020 defend PhD theme "Plasma technology for the formation of Nanoscale plasmonics elements and microwaves transistors". Working in Skoltech for 5 years in the field photonics.

Developing many technological processes and has qualification with working with high-tech equipment:

- Dry etching of noble metal (Ag, Au) through e-beam resist masks (PMMA, HSQ) with structure size < 200 nm for Plasmonic applications

- ICP CVD/PECVD of thin layers SiO2 and Si3N4

- Bosch processes with high aspect ratio structures (1:50) and TSV processes development (deep Si etching 525 microns) for MEMS deviceses

- Different oxide and nitrides etching (Al2O3, SiO2) for nano-pattern

- Niobium etching with low roughness for Quantum computing applications

- Developing topologies for laser, e-beam lithography and photolithograph

- ITO sputtering for optical applications

- E-beam deposition of different materials

Scope of research interests: Photonics, MEMS, quantum computing, microfluidics, electron-emissions devises.