Journal of Surface Investigation, volume 13, issue 3, pages 382-386
Study of a SiO2 /Si Structure Implanted with 64Zn+ and 16O+ Ions and Heat Treated in a Neutral Inert Environment
Privezentsev V. V.
1
,
Kulikauskas V.S
2
,
Zatekin V.V
2
,
Zinenko V.I.
3
,
Agafonov Yu.A.
3
,
Egorov V.K.
3
,
Steinman E. A.
4
,
Tereshchenko A N
4
,
Shcherbachev K. D.
5
2
Publication type: Journal Article
Publication date: 2019-05-01
Journal:
Journal of Surface Investigation
Quartile SCImago
Q3
Quartile WOS
—
Impact factor: 0.3
ISSN: 10274510, 18197094
Surfaces, Coatings and Films
Abstract
The surface layer of a SiO2/Si structure implanted with Zn+ and O+ ions and annealed in neutral and inert atmospheres is studied. At first, n-Si(100) silicon plates are oxidized in dry O2 to achieve an oxide-film thickness of 0.2 μm. Then, at room temperature, they are sequentially implanted with a dose of 5 × 1016 cm–2 of 70-keV 64Zn+ ions and with a dose of 6.1 × 1016 cm–2 of 40-keV $$^{{16}}{\text{O}}_{2}^{ + }$$ ions. Plate overheating, compared with room temperature, does not exceed 70°C. The samples are isochronously annealed for 1 h in N2 at a temperature from 400 to 600°C and then in Ar in the range of 700–1000°C with a step of 100°C. After implantation, the crystalline phase Zn(102) is found to form in the SiO2 film. After annealing at 700°C, Zn is oxidized to form the ZnO phase. Analysis of the diffraction patterns shows the β-Zn2SiO4 and Zn1.95SiO4 phases to be additionally formed in the samples after annealing at 800°C. After annealing at 900°C and above, the ZnO phase was not detected in the samples.
Citations by journals
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Journal Physics D: Applied Physics
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Journal Physics D: Applied Physics
2 publications, 100%
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Citations by publishers
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IOP Publishing
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IOP Publishing
2 publications, 100%
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Privezentsev V. V. et al. Study of a SiO2/Si Structure Implanted with 64Zn+ and 16O+ Ions and Heat Treated in a Neutral Inert Environment // Journal of Surface Investigation. 2019. Vol. 13. No. 3. pp. 382-386.
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Privezentsev V. V., Kulikauskas V., Zatekin V., Zinenko V., Agafonov Y., Egorov V., Steinman E. A., Tereshchenko A. N., Shcherbachev K. D. Study of a SiO2/Si Structure Implanted with 64Zn+ and 16O+ Ions and Heat Treated in a Neutral Inert Environment // Journal of Surface Investigation. 2019. Vol. 13. No. 3. pp. 382-386.
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TY - JOUR
DO - 10.1134/S1027451019030169
UR - https://doi.org/10.1134%2FS1027451019030169
TI - Study of a SiO2/Si Structure Implanted with 64Zn+ and 16O+ Ions and Heat Treated in a Neutral Inert Environment
T2 - Journal of Surface Investigation
AU - Privezentsev, V. V.
AU - Kulikauskas, V.S
AU - Zatekin, V.V
AU - Zinenko, V.I.
AU - Agafonov, Yu.A.
AU - Egorov, V.K.
AU - Steinman, E. A.
AU - Tereshchenko, A N
AU - Shcherbachev, K. D.
PY - 2019
DA - 2019/05/01 00:00:00
PB - Pleiades Publishing
SP - 382-386
IS - 3
VL - 13
SN - 1027-4510
SN - 1819-7094
ER -
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@article{2019_Privezentsev
author = {V. V. Privezentsev and V.S Kulikauskas and V.V Zatekin and V.I. Zinenko and Yu.A. Agafonov and V.K. Egorov and E. A. Steinman and A N Tereshchenko and K. D. Shcherbachev},
title = {Study of a SiO2/Si Structure Implanted with 64Zn+ and 16O+ Ions and Heat Treated in a Neutral Inert Environment},
journal = {Journal of Surface Investigation},
year = {2019},
volume = {13},
publisher = {Pleiades Publishing},
month = {may},
url = {https://doi.org/10.1134%2FS1027451019030169},
number = {3},
pages = {382--386},
doi = {10.1134/S1027451019030169}
}
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Privezentsev, V. V., et al. “Study of a SiO2/Si Structure Implanted with 64Zn+ and 16O+ Ions and Heat Treated in a Neutral Inert Environment.” Journal of Surface Investigation, vol. 13, no. 3, May. 2019, pp. 382-386. https://doi.org/10.1134%2FS1027451019030169.
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