Journal of Surface Investigation, volume 13, issue 3, pages 382-386

Study of a SiO2/Si Structure Implanted with 64Zn+ and 16O+ Ions and Heat Treated in a Neutral Inert Environment

Publication typeJournal Article
Publication date2019-05-01
Quartile SCImago
Q3
Quartile WOS
Impact factor0.3
ISSN10274510, 18197094
Surfaces, Coatings and Films
Abstract
The surface layer of a SiO2/Si structure implanted with Zn+ and O+ ions and annealed in neutral and inert atmospheres is studied. At first, n-Si(100) silicon plates are oxidized in dry O2 to achieve an oxide-film thickness of 0.2 μm. Then, at room temperature, they are sequentially implanted with a dose of 5 × 1016 cm–2 of 70-keV 64Zn+ ions and with a dose of 6.1 × 1016 cm–2 of 40-keV $$^{{16}}{\text{O}}_{2}^{ + }$$ ions. Plate overheating, compared with room temperature, does not exceed 70°C. The samples are isochronously annealed for 1 h in N2 at a temperature from 400 to 600°C and then in Ar in the range of 700–1000°C with a step of 100°C. After implantation, the crystalline phase Zn(102) is found to form in the SiO2 film. After annealing at 700°C, Zn is oxidized to form the ZnO phase. Analysis of the diffraction patterns shows the β-Zn2SiO4 and Zn1.95SiO4 phases to be additionally formed in the samples after annealing at 800°C. After annealing at 900°C and above, the ZnO phase was not detected in the samples.

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Privezentsev V. V. et al. Study of a SiO2/Si Structure Implanted with 64Zn+ and 16O+ Ions and Heat Treated in a Neutral Inert Environment // Journal of Surface Investigation. 2019. Vol. 13. No. 3. pp. 382-386.
GOST all authors (up to 50) Copy
Privezentsev V. V., Kulikauskas V., Zatekin V., Zinenko V., Agafonov Y., Egorov V., Steinman E. A., Tereshchenko A. N., Shcherbachev K. D. Study of a SiO2/Si Structure Implanted with 64Zn+ and 16O+ Ions and Heat Treated in a Neutral Inert Environment // Journal of Surface Investigation. 2019. Vol. 13. No. 3. pp. 382-386.
RIS |
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TY - JOUR
DO - 10.1134/S1027451019030169
UR - https://doi.org/10.1134%2FS1027451019030169
TI - Study of a SiO2/Si Structure Implanted with 64Zn+ and 16O+ Ions and Heat Treated in a Neutral Inert Environment
T2 - Journal of Surface Investigation
AU - Privezentsev, V. V.
AU - Kulikauskas, V.S
AU - Zatekin, V.V
AU - Zinenko, V.I.
AU - Agafonov, Yu.A.
AU - Egorov, V.K.
AU - Steinman, E. A.
AU - Tereshchenko, A N
AU - Shcherbachev, K. D.
PY - 2019
DA - 2019/05/01 00:00:00
PB - Pleiades Publishing
SP - 382-386
IS - 3
VL - 13
SN - 1027-4510
SN - 1819-7094
ER -
BibTex |
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@article{2019_Privezentsev
author = {V. V. Privezentsev and V.S Kulikauskas and V.V Zatekin and V.I. Zinenko and Yu.A. Agafonov and V.K. Egorov and E. A. Steinman and A N Tereshchenko and K. D. Shcherbachev},
title = {Study of a SiO2/Si Structure Implanted with 64Zn+ and 16O+ Ions and Heat Treated in a Neutral Inert Environment},
journal = {Journal of Surface Investigation},
year = {2019},
volume = {13},
publisher = {Pleiades Publishing},
month = {may},
url = {https://doi.org/10.1134%2FS1027451019030169},
number = {3},
pages = {382--386},
doi = {10.1134/S1027451019030169}
}
MLA
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MLA Copy
Privezentsev, V. V., et al. “Study of a SiO2/Si Structure Implanted with 64Zn+ and 16O+ Ions and Heat Treated in a Neutral Inert Environment.” Journal of Surface Investigation, vol. 13, no. 3, May. 2019, pp. 382-386. https://doi.org/10.1134%2FS1027451019030169.
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