Laboratory of Nuclear Physics Research Methods

Elemental analytical diagnostics of planar material structures with nanoscale resolution in target thickness. The analysis can be performed with the complex application of X-ray fluorescence analysis in conditions of complete external reflection of the excitation flux of hard X-ray radiation combined using the capabilities of ion-beam diagnostics of materials. X-ray fluorescence analysis with full external reflection is useful in the elemental analysis of surface layers with a thickness of 3-8 nanometers, and ion-beam methods allow analyzing the elemental concentration profile by target thickness in the range of surface layer thicknesses up to 2 microns with a resolution of 10-20 nm, and in the range up to 20 microns with a resolution of 50 nm. The complex of methods is all-element, non-destructive, and reverse Rutherford ion scattering spectrometry is the only absolute element-diagnostic hardware, that is, it does not need to perform quantitative measurements in standards and standards.