volume 45 issue 12 pages 1237-1240

Ion-Beam Deposition of Thin AlN Films on Al2O3 Substrate

Publication typeJournal Article
Publication date2019-12-01
scimago Q3
wos Q4
SJR0.215
CiteScore1.1
Impact factor0.9
ISSN10637850, 10906533, 17267471
Physics and Astronomy (miscellaneous)
Abstract
Thin aluminum nitride (AlN) films on sapphire (Al2O3) substrates were grown by means of ion-beam deposition (IBD) and studied by methods of scanning electron microscopy, Raman scattering, and optical transmission spectroscopy. Results revealed the influence of IBD process parameters (gas mixture composition, ion beam energy, and substrate temperature) on the morphology, structure, and optical properties of obtained thin AlN films on sapphire.
Found 
Found 

Top-30

Journals

1
Journal Physics D: Applied Physics
1 publication, 25%
Technical Physics Letters
1 publication, 25%
Critical Reviews in Solid State and Materials Sciences
1 publication, 25%
Solar Energy Materials and Solar Cells
1 publication, 25%
1

Publishers

1
IOP Publishing
1 publication, 25%
Pleiades Publishing
1 publication, 25%
Taylor & Francis
1 publication, 25%
Elsevier
1 publication, 25%
1
  • We do not take into account publications without a DOI.
  • Statistics recalculated weekly.

Are you a researcher?

Create a profile to get free access to personal recommendations for colleagues and new articles.
Metrics
4
Share
Cite this
GOST |
Cite this
GOST Copy
Lunin L. S. L. S. et al. Ion-Beam Deposition of Thin AlN Films on Al2O3 Substrate // Technical Physics Letters. 2019. Vol. 45. No. 12. pp. 1237-1240.
GOST all authors (up to 50) Copy
Lunin L. S. L. S., Devitskii O. V., Sysoev I. A., Pashchenko A., Kasyanov I. V., Nikulin D. A., Irkha V. A. Ion-Beam Deposition of Thin AlN Films on Al2O3 Substrate // Technical Physics Letters. 2019. Vol. 45. No. 12. pp. 1237-1240.
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.1134/S106378501912023X
UR - https://doi.org/10.1134/S106378501912023X
TI - Ion-Beam Deposition of Thin AlN Films on Al2O3 Substrate
T2 - Technical Physics Letters
AU - Lunin L. S., L. S.
AU - Devitskii, O V
AU - Sysoev, I. A.
AU - Pashchenko, A.S.
AU - Kasyanov, I V
AU - Nikulin, D A
AU - Irkha, V A
PY - 2019
DA - 2019/12/01
PB - Pleiades Publishing
SP - 1237-1240
IS - 12
VL - 45
SN - 1063-7850
SN - 1090-6533
SN - 1726-7471
ER -
BibTex |
Cite this
BibTex (up to 50 authors) Copy
@article{2019_Lunin L. S.,
author = {L. S. Lunin L. S. and O V Devitskii and I. A. Sysoev and A.S. Pashchenko and I V Kasyanov and D A Nikulin and V A Irkha},
title = {Ion-Beam Deposition of Thin AlN Films on Al2O3 Substrate},
journal = {Technical Physics Letters},
year = {2019},
volume = {45},
publisher = {Pleiades Publishing},
month = {dec},
url = {https://doi.org/10.1134/S106378501912023X},
number = {12},
pages = {1237--1240},
doi = {10.1134/S106378501912023X}
}
MLA
Cite this
MLA Copy
Lunin L. S., L. S., et al. “Ion-Beam Deposition of Thin AlN Films on Al2O3 Substrate.” Technical Physics Letters, vol. 45, no. 12, Dec. 2019, pp. 1237-1240. https://doi.org/10.1134/S106378501912023X.