Application of low hydrogen-diluted and low gaseous-pressure monosilane plasma to fast deposition of solar-cell-grade microcrystalline silicon
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Development Division, Komatsu Ltd.
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KELK Ltd.
Publication type: Journal Article
Publication date: 2016-11-30
SJR: —
CiteScore: —
Impact factor: —
ISSN: 13823469, 21881650
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Tabuchi T. et al. Application of low hydrogen-diluted and low gaseous-pressure monosilane plasma to fast deposition of solar-cell-grade microcrystalline silicon // Transactions of the Materials Research Society of Japan. 2016. Vol. 41. No. 4. pp. 385-392.
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Tabuchi T., Toyoshima Y., Fujimoto S., Takashiri M. Application of low hydrogen-diluted and low gaseous-pressure monosilane plasma to fast deposition of solar-cell-grade microcrystalline silicon // Transactions of the Materials Research Society of Japan. 2016. Vol. 41. No. 4. pp. 385-392.
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TY - JOUR
DO - 10.14723/tmrsj.41.385
UR - https://doi.org/10.14723/tmrsj.41.385
TI - Application of low hydrogen-diluted and low gaseous-pressure monosilane plasma to fast deposition of solar-cell-grade microcrystalline silicon
T2 - Transactions of the Materials Research Society of Japan
AU - Tabuchi, Toshihiro
AU - Toyoshima, Yasumasa
AU - Fujimoto, Shinichi
AU - Takashiri, Masayuki
PY - 2016
DA - 2016/11/30
PB - The Materials Research Society of Japan
SP - 385-392
IS - 4
VL - 41
SN - 1382-3469
SN - 2188-1650
ER -
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@article{2016_Tabuchi,
author = {Toshihiro Tabuchi and Yasumasa Toyoshima and Shinichi Fujimoto and Masayuki Takashiri},
title = {Application of low hydrogen-diluted and low gaseous-pressure monosilane plasma to fast deposition of solar-cell-grade microcrystalline silicon},
journal = {Transactions of the Materials Research Society of Japan},
year = {2016},
volume = {41},
publisher = {The Materials Research Society of Japan},
month = {nov},
url = {https://doi.org/10.14723/tmrsj.41.385},
number = {4},
pages = {385--392},
doi = {10.14723/tmrsj.41.385}
}
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MLA
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Tabuchi, Toshihiro, et al. “Application of low hydrogen-diluted and low gaseous-pressure monosilane plasma to fast deposition of solar-cell-grade microcrystalline silicon.” Transactions of the Materials Research Society of Japan, vol. 41, no. 4, Nov. 2016, pp. 385-392. https://doi.org/10.14723/tmrsj.41.385.