Growth of α-Ga2O3 on α-Al2O3 by conventional molecular-beam epitaxy and metal–oxide-catalyzed epitaxy

Jonathan McCandless 1
Derek Rowe 2
Naomi Pieczulewski 3
Vladimir Protasenko 4
M. Alonso-Orts 5
Martin S Williams 5
Martin Eickhoff 6
HUILI G. XING 7
David Muller 8
Debdeep Jena 9
Patrick Vogt 2
Publication typeJournal Article
Publication date2023-03-23
scimago Q3
wos Q3
SJR0.290
CiteScore2.9
Impact factor1.8
ISSN00214922, 13474065
General Physics and Astronomy
General Engineering
Abstract

We report the growth of α-Ga2O3 on m-plane α-Al2O3 by conventional plasma-assisted molecular-beam epitaxy and In-mediated metal–oxide-catalyzed epitaxy (MOCATAXY). We report a growth rate diagram for α-Ga2O3( 10 1 ¯ 0 ), and observe (i) a growth rate increase, (ii) an expanded growth window, and (iii) reduced out-of-plane mosaic spread when MOCATAXY is employed for the growth of α-Ga2O3. Through the use of In-mediated catalysis, growth rates over 0.2 μm h−1 and rocking curves with full width at half maxima of Δω ≈ 0.45° are achieved. Faceting is observed along the α-Ga2O3 film surface and explored through scanning transmission electron microscopy.

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McCandless J. et al. Growth of α-Ga2O3 on α-Al2O3 by conventional molecular-beam epitaxy and metal–oxide-catalyzed epitaxy // Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes. 2023. Vol. 62. No. SF. p. SF1013.
GOST all authors (up to 50) Copy
McCandless J., Rowe D., Pieczulewski N., Protasenko V., Alonso-Orts M., Williams M. S., Eickhoff M., XING H. G., Muller D., Jena D., Vogt P. Growth of α-Ga2O3 on α-Al2O3 by conventional molecular-beam epitaxy and metal–oxide-catalyzed epitaxy // Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes. 2023. Vol. 62. No. SF. p. SF1013.
RIS |
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RIS Copy
TY - JOUR
DO - 10.35848/1347-4065/acbe04
UR - https://doi.org/10.35848/1347-4065/acbe04
TI - Growth of α-Ga2O3 on α-Al2O3 by conventional molecular-beam epitaxy and metal–oxide-catalyzed epitaxy
T2 - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
AU - McCandless, Jonathan
AU - Rowe, Derek
AU - Pieczulewski, Naomi
AU - Protasenko, Vladimir
AU - Alonso-Orts, M.
AU - Williams, Martin S
AU - Eickhoff, Martin
AU - XING, HUILI G.
AU - Muller, David
AU - Jena, Debdeep
AU - Vogt, Patrick
PY - 2023
DA - 2023/03/23
PB - Japan Society of Applied Physics
SP - SF1013
IS - SF
VL - 62
SN - 0021-4922
SN - 1347-4065
ER -
BibTex |
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BibTex (up to 50 authors) Copy
@article{2023_McCandless,
author = {Jonathan McCandless and Derek Rowe and Naomi Pieczulewski and Vladimir Protasenko and M. Alonso-Orts and Martin S Williams and Martin Eickhoff and HUILI G. XING and David Muller and Debdeep Jena and Patrick Vogt},
title = {Growth of α-Ga2O3 on α-Al2O3 by conventional molecular-beam epitaxy and metal–oxide-catalyzed epitaxy},
journal = {Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes},
year = {2023},
volume = {62},
publisher = {Japan Society of Applied Physics},
month = {mar},
url = {https://doi.org/10.35848/1347-4065/acbe04},
number = {SF},
pages = {SF1013},
doi = {10.35848/1347-4065/acbe04}
}
MLA
Cite this
MLA Copy
McCandless, Jonathan, et al. “Growth of α-Ga2O3 on α-Al2O3 by conventional molecular-beam epitaxy and metal–oxide-catalyzed epitaxy.” Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes, vol. 62, no. SF, Mar. 2023, p. SF1013. https://doi.org/10.35848/1347-4065/acbe04.