Topics in Applied Physics

Modern Developments in Vacuum Electron Sources

Publication typeBook
Publication date2020-10-09
SJR
CiteScore1.3
Impact factor
ISSN03034216, 14370859

Top-30

Journals

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IEEE Transactions on Electron Devices
3 publications, 12.5%
Physics of Plasmas
2 publications, 8.33%
IEEE Transactions on Plasma Science
2 publications, 8.33%
Journal of Materials Chemistry C
1 publication, 4.17%
Nanomaterials
1 publication, 4.17%
Vakuum in Forschung und Praxis
1 publication, 4.17%
Nano Letters
1 publication, 4.17%
Technical Physics
1 publication, 4.17%
AIP Advances
1 publication, 4.17%
Nano Materials Science
1 publication, 4.17%
Small
1 publication, 4.17%
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
1 publication, 4.17%
Russian Chemical Reviews
1 publication, 4.17%
Instruments
1 publication, 4.17%
Ceramics International
1 publication, 4.17%
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Publishers

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Institute of Electrical and Electronics Engineers (IEEE)
9 publications, 37.5%
AIP Publishing
3 publications, 12.5%
Wiley
3 publications, 12.5%
MDPI
2 publications, 8.33%
Elsevier
2 publications, 8.33%
Royal Society of Chemistry (RSC)
1 publication, 4.17%
American Chemical Society (ACS)
1 publication, 4.17%
Pleiades Publishing
1 publication, 4.17%
American Vacuum Society
1 publication, 4.17%
Autonomous Non-profit Organization Editorial Board of the journal Uspekhi Khimii
1 publication, 4.17%
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  • We do not take into account publications without a DOI.
  • Statistics recalculated only for publications connected to researchers, organizations and labs registered on the platform.
  • Statistics recalculated weekly.

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