Organometallics, volume 29, issue 6, pages 1451-1456

Magnitudes of Electron-Withdrawing Effects of the Trifluoromethyl Ligand in Organometallic Complexes of Copper and Nickel

Kieltsch Iris 1
Dubinina Galyna G 1
Hamacher Claudia 2
Kaiser André 2
Torres Nieto Jorge 1
Hutchison John M 1
Klein Axel 2
Vicic David A. 1
Publication typeJournal Article
Publication date2010-02-15
Journal: Organometallics
Quartile SCImago
Q1
Quartile WOS
Q2
Impact factor2.8
ISSN02767333, 15206041
Organic Chemistry
Inorganic Chemistry
Physical and Theoretical Chemistry
Abstract
A variety of nickel and copper complexes bearing the trifluoromethyl ligand have been prepared in order to quantify by electrochemical methods the redox potentials relative to their chloro and methyl counterparts. The effects of coordination number and geometry, as well as the oxidation state of the metal, on the relative ease with which trifluoromethyl complexes can be oxidized have for the first time been identified. In the d10 system [(NHC)Cu(X)] (NHC = N-heterocyclic carbene, X = methyl or trifluoromethyl), a single substitution of methyl for trifluoromethyl raised the oxidation potential of the organometallic complex by approximately +0.6 V versus the ferrocene/ferrocenium (Fc/Fc+) couple, a testament to the extreme electron-withdrawing properties of the trifluoromethyl ligand. The ΔEox (methyl vs trifluoromethyl) for d8 nickel complexes were of similar magnitude; however the absolute oxidation potentials were dramatically dependent on the ligand (dippe = 1,2-bis(diisopropylphosphino)ethane vs BOXAM = bis(4-isopropyl-4,5-dihydrooxazol-2-yl)phenyl)amine).

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Kieltsch I. et al. Magnitudes of Electron-Withdrawing Effects of the Trifluoromethyl Ligand in Organometallic Complexes of Copper and Nickel // Organometallics. 2010. Vol. 29. No. 6. pp. 1451-1456.
GOST all authors (up to 50) Copy
Kieltsch I., Dubinina G. G., Hamacher C., Kaiser A., Torres Nieto J., Hutchison J. M., Klein A., Budnikova Y. H., Vicic D. A. Magnitudes of Electron-Withdrawing Effects of the Trifluoromethyl Ligand in Organometallic Complexes of Copper and Nickel // Organometallics. 2010. Vol. 29. No. 6. pp. 1451-1456.
RIS |
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RIS Copy
TY - JOUR
DO - 10.1021/om901122z
UR - https://doi.org/10.1021%2Fom901122z
TI - Magnitudes of Electron-Withdrawing Effects of the Trifluoromethyl Ligand in Organometallic Complexes of Copper and Nickel
T2 - Organometallics
AU - Kieltsch, Iris
AU - Dubinina, Galyna G
AU - Hamacher, Claudia
AU - Torres Nieto, Jorge
AU - Hutchison, John M
AU - Kaiser, André
AU - Klein, Axel
AU - Budnikova, Yulia H.
AU - Vicic, David A.
PY - 2010
DA - 2010/02/15 00:00:00
PB - American Chemical Society (ACS)
SP - 1451-1456
IS - 6
VL - 29
SN - 0276-7333
SN - 1520-6041
ER -
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@article{2010_Kieltsch,
author = {Iris Kieltsch and Galyna G Dubinina and Claudia Hamacher and Jorge Torres Nieto and John M Hutchison and André Kaiser and Axel Klein and Yulia H. Budnikova and David A. Vicic},
title = {Magnitudes of Electron-Withdrawing Effects of the Trifluoromethyl Ligand in Organometallic Complexes of Copper and Nickel},
journal = {Organometallics},
year = {2010},
volume = {29},
publisher = {American Chemical Society (ACS)},
month = {feb},
url = {https://doi.org/10.1021%2Fom901122z},
number = {6},
pages = {1451--1456},
doi = {10.1021/om901122z}
}
MLA
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Kieltsch, Iris, et al. “Magnitudes of Electron-Withdrawing Effects of the Trifluoromethyl Ligand in Organometallic Complexes of Copper and Nickel.” Organometallics, vol. 29, no. 6, Feb. 2010, pp. 1451-1456. https://doi.org/10.1021%2Fom901122z.
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