Ligand-free Heck reactions using low Pd-loading
Manfred T. Reetz
1
,
Johannes E. de Vries
2
2
DSM Pharma Chemicals, Advanced Synthesis, Catalysis & Development, PO box 18, 6160 MD Geleen, The Netherlands
|
Publication type: Journal Article
Publication date: 2004-07-20
scimago Q1
wos Q2
SJR: 1.037
CiteScore: 7.4
Impact factor: 4.2
ISSN: 13597345, 1364548X
DOI:
10.1039/b406719n
PubMed ID:
15263925
Materials Chemistry
Metals and Alloys
Surfaces, Coatings and Films
General Chemistry
Ceramics and Composites
Electronic, Optical and Magnetic Materials
Catalysis
Abstract
Activated and non-activated aryl bromides undergo smooth ligand-less Heck reactions, provided low amounts of palladium salts such as Pd(OAc)2 are used (ideally 0.01-0.1 mol%). This industrially viable process appears to involve palladium nanoparticles.
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Metrics
625
Total citations:
625
Citations from 2025:
7
(1.12%)
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GOST
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Reetz M. T., de Vries J. E. Ligand-free Heck reactions using low Pd-loading // Chemical Communications. 2004. Vol. 14. p. 1559.
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Reetz M. T., de Vries J. E. Ligand-free Heck reactions using low Pd-loading // Chemical Communications. 2004. Vol. 14. p. 1559.
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RIS
Copy
TY - JOUR
DO - 10.1039/b406719n
UR - https://doi.org/10.1039/b406719n
TI - Ligand-free Heck reactions using low Pd-loading
T2 - Chemical Communications
AU - Reetz, Manfred T.
AU - de Vries, Johannes E.
PY - 2004
DA - 2004/07/20
PB - Royal Society of Chemistry (RSC)
SP - 1559
IS - 14
PMID - 15263925
SN - 1359-7345
SN - 1364-548X
ER -
Cite this
BibTex (up to 50 authors)
Copy
@article{2004_Reetz,
author = {Manfred T. Reetz and Johannes E. de Vries},
title = {Ligand-free Heck reactions using low Pd-loading},
journal = {Chemical Communications},
year = {2004},
publisher = {Royal Society of Chemistry (RSC)},
month = {jul},
url = {https://doi.org/10.1039/b406719n},
number = {14},
pages = {1559},
doi = {10.1039/b406719n}
}
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