Iron and intrinsic deep level states in Ga2O3
Using a combination of deep level transient spectroscopy, secondary ion mass spectrometry, proton irradiation, and hybrid functional calculations, we identify two similar deep levels that are associated with Fe impurities and intrinsic defects in bulk crystals and molecular beam epitaxy and hydride vapor phase epitaxi-grown epilayers of β-Ga2O3. First, our results indicate that FeGa, and not an intrinsic defect, acts as the deep acceptor responsible for the often dominating E2 level at ∼0.78 eV below the conduction band minimum. Second, by provoking additional intrinsic defect generation via proton irradiation, we identified the emergence of a new level, labeled as E2*, having the ionization energy very close to that of E2, but exhibiting an order of magnitude larger capture cross section. Importantly, the properties of E2* are found to be consistent with its intrinsic origin. As such, contradictory opinions of a long standing literature debate on either extrinsic or intrinsic origin of the deep acceptor in question converge accounting for possible contributions from E2 and E2* in different experimental conditions.
Top-30
Journals
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Journal of Applied Physics
51 publications, 19.92%
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Applied Physics Letters
36 publications, 14.06%
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APL Materials
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10 publications, 3.91%
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Physical Review Materials
7 publications, 2.73%
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6 publications, 2.34%
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IEEE Transactions on Electron Devices
5 publications, 1.95%
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Materials Science in Semiconductor Processing
4 publications, 1.56%
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Physica Status Solidi (A) Applications and Materials Science
4 publications, 1.56%
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4 publications, 1.56%
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Springer Series in Materials Science
4 publications, 1.56%
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Physical Review B
3 publications, 1.17%
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Scientific Reports
3 publications, 1.17%
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Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
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3 publications, 1.17%
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3 publications, 1.17%
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3 publications, 1.17%
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2 publications, 0.78%
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2 publications, 0.78%
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2 publications, 0.78%
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Materials
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ACS Omega
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Physical Review Applied
1 publication, 0.39%
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Publishers
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AIP Publishing
112 publications, 43.75%
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IOP Publishing
26 publications, 10.16%
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Elsevier
22 publications, 8.59%
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Springer Nature
12 publications, 4.69%
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Wiley
12 publications, 4.69%
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American Physical Society (APS)
11 publications, 4.3%
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Institute of Electrical and Electronics Engineers (IEEE)
11 publications, 4.3%
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Royal Society of Chemistry (RSC)
11 publications, 4.3%
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The Electrochemical Society
10 publications, 3.91%
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American Vacuum Society
8 publications, 3.13%
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American Chemical Society (ACS)
8 publications, 3.13%
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MDPI
5 publications, 1.95%
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Japan Society of Applied Physics
4 publications, 1.56%
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SPIE-Intl Soc Optical Eng
2 publications, 0.78%
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Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences
1 publication, 0.39%
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- We do not take into account publications without a DOI.
- Statistics recalculated weekly.