Journal of Micromechanics and Microengineering, volume 31, issue 5, pages 55011
Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores
Publication type: Journal Article
Publication date: 2021-04-13
Quartile SCImago
Q2
Quartile WOS
Q3
Impact factor: 2.3
ISSN: 09601317, 13616439
Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering
Mechanical Engineering
Mechanics of Materials
Abstract
Patterning using a focused ionizing radiation beam provides a high spatial resolution but is not feasible when creating large arrays of microstructures. We propose the optimization of x-ray lithography parameters to create submicropores in a low-sensitivity material (polyethylene terephthalate) using a wide x-ray beam. This optimization results in the fabrication of regularly arranged micropores with a high aspect ratio (over 20) and diameters of up to 0.4 µm across a large substrate area (up to several square centimeters).
Citations by journals
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3
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Journal of Surface Investigation
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Journal of Surface Investigation
3 publications, 75%
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Scientific Reports
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Scientific Reports
1 publication, 25%
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1
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3
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Citations by publishers
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3
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Pleiades Publishing
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Pleiades Publishing
3 publications, 75%
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Springer Nature
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Springer Nature
1 publication, 25%
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- We do not take into account publications that without a DOI.
- Statistics recalculated only for publications connected to researchers, organizations and labs registered on the platform.
- Statistics recalculated weekly.
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Nazmov V. et al. Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores // Journal of Micromechanics and Microengineering. 2021. Vol. 31. No. 5. p. 55011.
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Nazmov V., Goldenberg B., Vasiliev A., Asadchikov V. Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores // Journal of Micromechanics and Microengineering. 2021. Vol. 31. No. 5. p. 55011.
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RIS
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TY - JOUR
DO - 10.1088/1361-6439/abf331
UR - https://doi.org/10.1088%2F1361-6439%2Fabf331
TI - Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores
T2 - Journal of Micromechanics and Microengineering
AU - Nazmov, V
AU - Goldenberg, B.
AU - Vasiliev, Anton
AU - Asadchikov, V
PY - 2021
DA - 2021/04/13 00:00:00
PB - IOP Publishing
SP - 55011
IS - 5
VL - 31
SN - 0960-1317
SN - 1361-6439
ER -
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@article{2021_Nazmov,
author = {V Nazmov and B. Goldenberg and Anton Vasiliev and V Asadchikov},
title = {Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores},
journal = {Journal of Micromechanics and Microengineering},
year = {2021},
volume = {31},
publisher = {IOP Publishing},
month = {apr},
url = {https://doi.org/10.1088%2F1361-6439%2Fabf331},
number = {5},
pages = {55011},
doi = {10.1088/1361-6439/abf331}
}
Cite this
MLA
Copy
Nazmov, V., et al. “Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores.” Journal of Micromechanics and Microengineering, vol. 31, no. 5, Apr. 2021, p. 55011. https://doi.org/10.1088%2F1361-6439%2Fabf331.
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