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Lab team

The research goal of the project is to find out how high concentrations of point defects and associated elastic stresses in wide-bandgap semiconductors based on gallium oxide can overcome the main disadvantages of such a system: low thermal conductivity, absence of impurities or defects that create effective hole conductivity, pronounced polymorphism, strong metastability of properties. All this currently slows down the introduction of devices based on gallium oxide into real electronic and optoelectronic devices and hinders the commercialization of technologies based on this material. The scientists of the project demonstrated the possibility of manufacturing a new material and effectively managing its properties using an economical technology of its cultivation. Ga2O3 is a promising alternative to silicon in power semiconductor electronic devices and allows one to work with higher voltages, at higher temperatures and with less power loss. The group of Professor Vladimir Nikolaev managed to grow thick α-Ga2O3 films with a sufficiently high structural perfection and introduce impurity tin atoms into them, supplying electrons and changing the conductivity of the films in a very wide range. Researchers led by Professor Alexander Polyakov created test diode structures from the prepared films and studied in detail the electronic properties of the material, as well as the electronic structure of the impurities and defects present in it. The results obtained inspire optimism about the prospects of using Ga2O3 in power devices, but very serious additional research will be required to increase the stability of the material and improve its characteristics and their reproducibility. The research team of the Laboratory of Ultra-wide Bandgap Semiconductors actively cooperates with the University of Kore (South Korea), the University of Oslo (Norway), the University of Florida, the Ioffe Institute (St. Petersburg), Tomsk University, the Kurchatov Institute, etc. The laboratory will become a Russian coordination center for research of fundamental properties and physics of devices based on wide-bandgap materials: gallium oxide, nitrides of the third group, diamond, silicon carbide, etc. In particular, in the near future efforts will be focused on comprehensive studies of the gallium oxide system.

  1. Admittance Spectroscopy
  2. Current-voltage characterization
  3. Relaxation spectroscopy of deep levels (Deep Level Transient Spectroscopy)
  4. Volt-farad profiling
Alexander Polyakov
Head of Laboratory
Yakimov, E B
E Yakimov
Head of Division
Saranin, Danila Sergeevich
Danila Saranin 🥼 🤝
Head of Division
S Didenko
Leading Specialist
Schemerov, Ivan Vasilyevich
Ivan Schemerov
Lead Engineer
Anton Vasilev 🤝
Engineer of 1 category

Research directions

New radiation phenomena in gallium oxide and their applications in devices

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Project Goal: To understand how high concentrations of point defects and associated elastic stresses in Ga2O3-based wide-gap semiconductors may allow overcoming the main disadvantages of the Ga2O3 system: low thermal conductivity, lack of impurities or defects that create effective hole conduction, pronounced polymorphism and difficulty in combining different polymorphs in the same device to maximize the positive effects given by each polymorph, strong metastability of properties. Project objectives: 1. Active utilization of radiation defects created by ion implantation. 2. Control and optimization of this process to obtain the desired material properties.

Publications and patents

Partners

Lab address

Москва, Ленинский пр-кт, д. 4, стр. 1
Authorization required.