Laboratory of Atomic Layer Deposition and Physics of Nanoelectronic Structures
Publications
108
Citations
2 723
h-index
28
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- Two-dimensional semiconductors based on transition metal dichalcogendes (TMDC), logics and memory transistors based on TMDC; - Multicomponent high-k oxides aimed on gate CMOS dielectrics or on MIM-capacitors applications; - ALD doping for stabilization of oxide metastable phases with novel properties ( e.g. HfO2 based ferroelectrics for FeRAM); - In situ control of oxygen vacancies concentration in ALD oxides for resistive-switched memory and neuromorphic devices);
Research directions
- Two-dimensional semiconductors based on transition metal dichalcogendes (TMDC), logics and memory transistors based on TMDC
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Publications and patents
Lab address
Россия, Московская область, Долгопрудный, Институтский пер., д. 9
Authorization required.