Found 
Found 
Found 
Total publications
4
Total citations
13
Citations per publication
3.25
Average publications per year
1.33
Average coauthors
5
Publications years
2023-2025 (3 years)
h-index
2
i10-index
1
m-index
0.67
o-index
4
g-index
3
w-index
1
Metrics description
h-index
A scientist has an h-index if h of his N publications are cited at least h times each, while the remaining (N - h) publications are cited no more than h times each.
i10-index
The number of the author's publications that received at least 10 links each.
m-index
The researcher's m-index is numerically equal to the ratio of his h-index to the number of years that have passed since the first publication.
o-index
The geometric mean of the h-index and the number of citations of the most cited article of the scientist.
g-index
For a given set of articles, sorted in descending order of the number of citations that these articles received, the g-index is the largest number such that the g most cited articles received (in total) at least g2 citations.
w-index
If w articles of a researcher have at least 10w citations each and other publications are less than 10(w+1) citations, then the researcher's w-index is equal to w.

Top-100

Fields of science

1
Surfaces, Coatings and Films, 1, 25%
Surfaces, Coatings and Films
1 publication, 25%
Condensed Matter Physics, 1, 25%
Condensed Matter Physics
1 publication, 25%
Surfaces and Interfaces, 1, 25%
Surfaces and Interfaces
1 publication, 25%
1

Journals

1
2
Microelectronic Engineering
2 publications, 50%
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
1 publication, 25%
ECS Meeting Abstracts
1 publication, 25%
1
2

Citing journals

1
2
Journal not defined, 2, 15.38%
Journal not defined
2 citations, 15.38%
Solid State Phenomena
2 citations, 15.38%
Surfaces and Interfaces
1 citation, 7.69%
ACS applied materials & interfaces
1 citation, 7.69%
Engineering
1 citation, 7.69%
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
1 citation, 7.69%
Chemistry of Materials
1 citation, 7.69%
Small
1 citation, 7.69%
Microelectronic Engineering
1 citation, 7.69%
Advanced Engineering Materials
1 citation, 7.69%
Advanced Materials Interfaces
1 citation, 7.69%
1
2

Publishers

1
2
Elsevier
2 publications, 50%
American Vacuum Society
1 publication, 25%
The Electrochemical Society
1 publication, 25%
1
2

Organizations from articles

1
2
Organization not defined, 2, 50%
Organization not defined
2 publications, 50%
Interuniversity Microelectronics Centre
2 publications, 50%
1
2

Countries from articles

1
2
Country not defined, 2, 50%
Country not defined
2 publications, 50%
Germany, 2, 50%
Germany
2 publications, 50%
Belgium, 2, 50%
Belgium
2 publications, 50%
Japan, 1, 25%
Japan
1 publication, 25%
1
2

Citing organizations

1
2
3
4
5
6
Interuniversity Microelectronics Centre
6 citations, 46.15%
Organization not defined, 4, 30.77%
Organization not defined
4 citations, 30.77%
National University of Singapore
4 citations, 30.77%
Agency for Science, Technology and Research
4 citations, 30.77%
Institute of Materials Research and Engineering
2 citations, 15.38%
Fudan University
1 citation, 7.69%
Katholieke Universiteit Leuven
1 citation, 7.69%
Samsung
1 citation, 7.69%
Korea Advanced Institute of Science and Technology
1 citation, 7.69%
Korea Institute of Energy Research
1 citation, 7.69%
University of Colorado Boulder
1 citation, 7.69%
1
2
3
4
5
6

Citing countries

1
2
3
4
5
6
7
8
Belgium, 8, 61.54%
Belgium
8 citations, 61.54%
Singapore, 4, 30.77%
Singapore
4 citations, 30.77%
Finland, 2, 15.38%
Finland
2 citations, 15.38%
Country not defined, 1, 7.69%
Country not defined
1 citation, 7.69%
Germany, 1, 7.69%
Germany
1 citation, 7.69%
USA, 1, 7.69%
USA
1 citation, 7.69%
China, 1, 7.69%
China
1 citation, 7.69%
United Kingdom, 1, 7.69%
United Kingdom
1 citation, 7.69%
Republic of Korea, 1, 7.69%
Republic of Korea
1 citation, 7.69%
1
2
3
4
5
6
7
8
  • We do not take into account publications without a DOI.
  • Statistics recalculated daily.