Chemical Vapor Deposition

Wiley
Wiley
ISSN: 09481907, 15213862

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journal names
Chemical Vapor Deposition
Publications
1 327
Citations
25 530
h-index
65
Top-3 citing journals
Chemical Vapor Deposition
Chemical Vapor Deposition (907 citations)
Chemistry of Materials
Chemistry of Materials (905 citations)
Thin Solid Films
Thin Solid Films (771 citations)
Top-3 organizations
University of Helsinki
University of Helsinki (43 publications)
Ruhr University Bochum
Ruhr University Bochum (32 publications)
University College London
University College London (32 publications)
Top-3 countries
USA (176 publications)
Germany (155 publications)
United Kingdom (144 publications)

Most cited in 5 years

Top-100

Citing journals

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Publishing countries

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USA, 176, 13.26%
Germany, 155, 11.68%
United Kingdom, 144, 10.85%
China, 89, 6.71%
France, 87, 6.56%
Italy, 77, 5.8%
Japan, 64, 4.82%
Finland, 55, 4.14%
Republic of Korea, 53, 3.99%
Russia, 35, 2.64%
Spain, 27, 2.03%
Sweden, 27, 2.03%
Netherlands, 26, 1.96%
Poland, 26, 1.96%
Belgium, 23, 1.73%
Switzerland, 19, 1.43%
Canada, 18, 1.36%
Estonia, 11, 0.83%
India, 10, 0.75%
New Zealand, 10, 0.75%
Singapore, 10, 0.75%
Austria, 8, 0.6%
Greece, 8, 0.6%
Ireland, 8, 0.6%
Portugal, 7, 0.53%
Australia, 6, 0.45%
Norway, 6, 0.45%
Malaysia, 5, 0.38%
Mexico, 5, 0.38%
Turkey, 5, 0.38%
Argentina, 4, 0.3%
Iran, 4, 0.3%
Lithuania, 4, 0.3%
Tunisia, 4, 0.3%
Czech Republic, 4, 0.3%
Bulgaria, 3, 0.23%
Hungary, 3, 0.23%
Israel, 3, 0.23%
Romania, 3, 0.23%
Saudi Arabia, 3, 0.23%
Ukraine, 2, 0.15%
Brazil, 2, 0.15%
Pakistan, 2, 0.15%
Slovakia, 2, 0.15%
Belarus, 1, 0.08%
Algeria, 1, 0.08%
Vietnam, 1, 0.08%
Egypt, 1, 0.08%
Luxembourg, 1, 0.08%
Syria, 1, 0.08%
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