Laboratory of 3D Printing technologies for functional Microstructures
Publications
184
Citations
2 733
h-index
29
Authorization required.
Manufacture of ultra-high resolution polymer optical structures. Development of a STED-DLW photolithography installation based on the direct laser writing (DLW) method using an additional quenching laser (STED- Stimulated Emission Depletion).
- Laser diffraction
- Dark-field microscopy
- Scanning electron microscopy (SEM)
- Photoluminescence
Alexei Vitukhnovsky
Head of Laboratory
Kolymagin Danila
Researcher
Anastasia Pisarenko
Junior researcher
Research directions
Direct (3+1)D laser writing of photonic integrated circuit elements
+
The Project proposes the development of new generation additive laser technologies in relation to the creation of photonic devices, in particular, using direct (3+1)D letters based on femtosecond two-photon photopolymerization. The main idea of this approach is the possibility of influencing the optical and mechanical properties of the material of 3D structures both in the process of lithography and controlling the properties of the obtained optical elements by controlling external conditions such as temperature, electric and magnetic fields. Thus, in addition to the three spatial coordinates, another key independent variable for optical elements is added - the refractive index of matter.
Generation of indistinguishable photons at room temperature in cascading 3D resonators for photonic integrated circuits based on additive technologies
+
The project is aimed at developing additive technology for creating photonic integrated circuits (FIS) and solving the most important problem of quantum photonics based on this technology - the generation of single photons with a high degree of indistinguishability. Photonic integrated circuits contain many optically interconnected components made on the same substrate and jointly performing various functions of processing optical signals (in the visible or near infrared wavelength ranges).
Nanoimprint lithography for the mass creation of 2.5D elements of micro optics and optoelectronics
+
Within the framework of this Project, a solution is proposed to the problem of creating three-dimensional master stamps for nanoimprint lithography using direct laser printing technology. This approach makes it possible to create not only elements of complex planar topology with element sizes up to 150 nm, but also to set a volumetric relief on the surface of substrates and chips. This advantage may make it possible to massively create passive photonic and diffraction elements, arrays of microlenses, and elements for combining multilayer lithographic processes for microelectromechanical systems (MEMS). During the Project, it is planned to implement and research the NIL technology with DLW master stamps created on the basis of original photographic compositions, including acrylic monomers with domestic photoinitiators.
Publications and patents
Found
Nothing found, try to update filter.
2022
—
2025
| Колымагин Данила Анатольевич
2022
—
2024
| Витухновский Алексей Григорьевич
Lab address
Долгопрудный, Институтский переулок, 9
Authorization required.