Found 
Found 
Found 
Total publications
24
Total citations
103
Citations per publication
4.29
Average publications per year
2.67
Average coauthors
5.58
Publications years
2016-2024 (9 years)
h-index
6
i10-index
3
m-index
0.67
o-index
12
g-index
9
w-index
1
Metrics description
h-index
A scientist has an h-index if h of his N publications are cited at least h times each, while the remaining (N - h) publications are cited no more than h times each.
i10-index
The number of the author's publications that received at least 10 links each.
m-index
The researcher's m-index is numerically equal to the ratio of his h-index to the number of years that have passed since the first publication.
o-index
The geometric mean of the h-index and the number of citations of the most cited article of the scientist.
g-index
For a given set of articles, sorted in descending order of the number of citations that these articles received, the g-index is the largest number such that the g most cited articles received (in total) at least g2 citations.
w-index
If w articles of a researcher have at least 10w citations each and other publications are less than 10(w+1) citations, then the researcher's w-index is equal to w.

Top-100

Fields of science

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4
6
8
10
Electronic, Optical and Magnetic Materials, 10, 41.67%
Electronic, Optical and Magnetic Materials
10 publications, 41.67%
Condensed Matter Physics, 10, 41.67%
Condensed Matter Physics
10 publications, 41.67%
Materials Chemistry, 9, 37.5%
Materials Chemistry
9 publications, 37.5%
Electrical and Electronic Engineering, 7, 29.17%
Electrical and Electronic Engineering
7 publications, 29.17%
Surfaces, Coatings and Films, 5, 20.83%
Surfaces, Coatings and Films
5 publications, 20.83%
Electrochemistry, 3, 12.5%
Electrochemistry
3 publications, 12.5%
Surfaces and Interfaces, 3, 12.5%
Surfaces and Interfaces
3 publications, 12.5%
Process Chemistry and Technology, 2, 8.33%
Process Chemistry and Technology
2 publications, 8.33%
General Materials Science, 2, 8.33%
General Materials Science
2 publications, 8.33%
Instrumentation, 2, 8.33%
Instrumentation
2 publications, 8.33%
General Chemistry, 1, 4.17%
General Chemistry
1 publication, 4.17%
Spectroscopy, 1, 4.17%
Spectroscopy
1 publication, 4.17%
General Medicine, 1, 4.17%
General Medicine
1 publication, 4.17%
General Physics and Astronomy, 1, 4.17%
General Physics and Astronomy
1 publication, 4.17%
Acoustics and Ultrasonics, 1, 4.17%
Acoustics and Ultrasonics
1 publication, 4.17%
Automotive Engineering, 1, 4.17%
Automotive Engineering
1 publication, 4.17%
2
4
6
8
10

Journals

1
2
3
4
5
Russian Microelectronics
5 publications, 20.83%
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
2 publications, 8.33%
ACS Applied Electronic Materials
2 publications, 8.33%
Izvestiya Vysshikh Uchebnykh Zavedenii Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering
2 publications, 8.33%
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
1 publication, 4.17%
Physica Status Solidi (B): Basic Research
1 publication, 4.17%
Materials Chemistry and Physics
1 publication, 4.17%
Applied Surface Science
1 publication, 4.17%
Journal Physics D: Applied Physics
1 publication, 4.17%
Langmuir
1 publication, 4.17%
Proceedings of SPIE - The International Society for Optical Engineering
1 publication, 4.17%
Modern Electronic Materials
1 publication, 4.17%
1
2
3
4
5

Citing journals

2
4
6
8
10
12
14
Russian Microelectronics
14 citations, 13.59%
Journal Physics D: Applied Physics
9 citations, 8.74%
Plasma Processes and Polymers
9 citations, 8.74%
Journal not defined, 6, 5.83%
Journal not defined
6 citations, 5.83%
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
4 citations, 3.88%
ACS Applied Electronic Materials
4 citations, 3.88%
ECS Journal of Solid State Science and Technology
3 citations, 2.91%
Nanomaterials
3 citations, 2.91%
Journal of Non-Crystalline Solids
3 citations, 2.91%
Applied Physics Reviews
2 citations, 1.94%
Microporous and Mesoporous Materials
2 citations, 1.94%
Frontiers of Chemical Science and Engineering
2 citations, 1.94%
Journal of Applied Physics
2 citations, 1.94%
Langmuir
2 citations, 1.94%
Coatings
2 citations, 1.94%
IEEE Transactions on Materials for Electron Devices
2 citations, 1.94%
IEEE Transactions on Semiconductor Manufacturing
1 citation, 0.97%
Materials Letters
1 citation, 0.97%
Micron
1 citation, 0.97%
ACS applied materials & interfaces
1 citation, 0.97%
Nature Communications
1 citation, 0.97%
Journal of Physics: Conference Series
1 citation, 0.97%
Applied Physics Letters
1 citation, 0.97%
Pharmaceutics
1 citation, 0.97%
Plasma Sources Science and Technology
1 citation, 0.97%
Physica Status Solidi (A) Applications and Materials Science
1 citation, 0.97%
Journal of Sol-Gel Science and Technology
1 citation, 0.97%
Vacuum
1 citation, 0.97%
Physics of Plasmas
1 citation, 0.97%
Surface and Coatings Technology
1 citation, 0.97%
Applied Surface Science
1 citation, 0.97%
Phosphorus, Sulfur and Silicon and the Related Elements
1 citation, 0.97%
Scientific Reports
1 citation, 0.97%
High Energy Chemistry
1 citation, 0.97%
Applied Sciences (Switzerland)
1 citation, 0.97%
Microelectronic Engineering
1 citation, 0.97%
Thin Solid Films
1 citation, 0.97%
Acta Physica Sinica
1 citation, 0.97%
Angewandte Chemie - International Edition
1 citation, 0.97%
Journal of Polymers and the Environment
1 citation, 0.97%
Plasma Physics Reports
1 citation, 0.97%
AIP Conference Proceedings
1 citation, 0.97%
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
1 citation, 0.97%
Technical Physics Letters
1 citation, 0.97%
Materials
1 citation, 0.97%
Angewandte Chemie
1 citation, 0.97%
Russian Technological Journal
1 citation, 0.97%
Plasma Research Express
1 citation, 0.97%
Nanoenergy Advances
1 citation, 0.97%
Микроэлектроника
1 citation, 0.97%
2
4
6
8
10
12
14

Publishers

1
2
3
4
5
Pleiades Publishing
5 publications, 20.83%
American Chemical Society (ACS)
3 publications, 12.5%
Elsevier
2 publications, 8.33%
American Vacuum Society
2 publications, 8.33%
National University of Science & Technology (MISiS)
2 publications, 8.33%
Wiley
1 publication, 4.17%
AIP Publishing
1 publication, 4.17%
Pensoft Publishers
1 publication, 4.17%
IOP Publishing
1 publication, 4.17%
SPIE-Intl Soc Optical Eng
1 publication, 4.17%
1
2
3
4
5

Organizations from articles

2
4
6
8
10
12
14
16
18
Moscow Institute of Physics and Technology
17 publications, 34%
Organization not defined, 6, 12%
Organization not defined
6 publications, 12%
MIREA — Russian Technological University
6 publications, 12%
Institute of Physics and Technology of NRC «Kurchatov Institute»
5 publications, 10%
Interuniversity Microelectronics Centre
4 publications, 8%
North China University of Technology
3 publications, 6%
Lomonosov Moscow State University
2 publications, 4%
Fraunhofer Institute for Material and Beam Technology
2 publications, 4%
Institute of Spectroscopy of the Russian Academy of Sciences
1 publication, 2%
National Research University of Electronic Technology
1 publication, 2%
Helmholtz-Zentrum Dresden-Rossendorf
1 publication, 2%
Leibniz Institute of Surface Engineering
1 publication, 2%
Minia University
1 publication, 2%
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4
6
8
10
12
14
16
18

Countries from articles

5
10
15
20
25
Russia, 22, 47.83%
Russia
22 publications, 47.83%
Belgium, 6, 13.04%
Belgium
6 publications, 13.04%
China, 5, 10.87%
China
5 publications, 10.87%
Germany, 3, 6.52%
Germany
3 publications, 6.52%
USA, 3, 6.52%
USA
3 publications, 6.52%
Japan, 3, 6.52%
Japan
3 publications, 6.52%
Finland, 2, 4.35%
Finland
2 publications, 4.35%
Country not defined, 1, 2.17%
Country not defined
1 publication, 2.17%
Egypt, 1, 2.17%
Egypt
1 publication, 2.17%
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10
15
20
25

Citing organizations

2
4
6
8
10
12
14
16
Organization not defined, 16, 10.81%
Organization not defined
16 citations, 10.81%
MIREA — Russian Technological University
13 citations, 8.78%
Lomonosov Moscow State University
10 citations, 6.76%
Moscow Institute of Physics and Technology
9 citations, 6.08%
Institute of Physics and Technology of NRC «Kurchatov Institute»
9 citations, 6.08%
North China University of Technology
6 citations, 4.05%
National Chi Nan University
6 citations, 4.05%
Feng Chia University
5 citations, 3.38%
National Formosa University
5 citations, 3.38%
Interuniversity Microelectronics Centre
5 citations, 3.38%
Leibniz Institute of Surface Engineering
5 citations, 3.38%
University of Wisconsin–Madison
3 citations, 2.03%
Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
2 citations, 1.35%
Moscow Power Engineering Institute
2 citations, 1.35%
Ivanovo State University of Chemistry and Technology
2 citations, 1.35%
University of Chinese Academy of Sciences
2 citations, 1.35%
Beihang University
2 citations, 1.35%
Helmholtz-Zentrum Dresden-Rossendorf
2 citations, 1.35%
Stanford University
2 citations, 1.35%
National Institute of Standards and Technology
2 citations, 1.35%
National Center for Nanoscience and Technology, Chinese Academy of Sciences
2 citations, 1.35%
Minia University
2 citations, 1.35%
A.N.Nesmeyanov Institute of Organoelement Compounds of the Russian Academy of Sciences
1 citation, 0.68%
National University of Science & Technology (MISiS)
1 citation, 0.68%
Enikolopov Institute of Synthetic Polymeric Materials of the Russian Academy of Sciences
1 citation, 0.68%
Nikolaev Institute of Inorganic Chemistry of the Siberian Branch of the Russian Academy of Sciences
1 citation, 0.68%
Institute of Spectroscopy of the Russian Academy of Sciences
1 citation, 0.68%
National Research University of Electronic Technology
1 citation, 0.68%
Tel Aviv University
1 citation, 0.68%
Katholieke Universiteit Leuven
1 citation, 0.68%
Grenoble Alpes University
1 citation, 0.68%
University of Naples Federico II
1 citation, 0.68%
Tianjin University
1 citation, 0.68%
National Synchrotron Radiation Research Center
1 citation, 0.68%
National Tsing Hua University
1 citation, 0.68%
National Yang Ming Chiao Tung University
1 citation, 0.68%
Georgia Institute of technology
1 citation, 0.68%
Sungkyunkwan University
1 citation, 0.68%
Chonnam National University
1 citation, 0.68%
University of California, San Diego
1 citation, 0.68%
Nagoya University
1 citation, 0.68%
National Institute of Advanced Industrial Science and Technology
1 citation, 0.68%
National University of General San Martín
1 citation, 0.68%
University of Illinois Urbana-Champaign
1 citation, 0.68%
Chemnitz University of Technology
1 citation, 0.68%
Fraunhofer Institute for Material and Beam Technology
1 citation, 0.68%
Bielefeld University of Applied Sciences
1 citation, 0.68%
University of Tokyo
1 citation, 0.68%
University of Maryland, College Park
1 citation, 0.68%
Toshiba Corporation
1 citation, 0.68%
Japan Society for the Promotion of Science
1 citation, 0.68%
Silesian University of Technology
1 citation, 0.68%
Western University
1 citation, 0.68%
Wake Forest University
1 citation, 0.68%
University of Tartu
1 citation, 0.68%
University of Connecticut
1 citation, 0.68%
Mawlana Bhashani Science and Technology University
1 citation, 0.68%
Dhaka University of Engineering & Technology
1 citation, 0.68%
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6
8
10
12
14
16

Citing countries

5
10
15
20
25
30
35
Russia, 31, 26.27%
Russia
31 citations, 26.27%
China, 19, 16.1%
China
19 citations, 16.1%
Country not defined, 12, 10.17%
Country not defined
12 citations, 10.17%
Belgium, 12, 10.17%
Belgium
12 citations, 10.17%
USA, 11, 9.32%
USA
11 citations, 9.32%
Germany, 8, 6.78%
Germany
8 citations, 6.78%
Japan, 6, 5.08%
Japan
6 citations, 5.08%
France, 4, 3.39%
France
4 citations, 3.39%
Bangladesh, 2, 1.69%
Bangladesh
2 citations, 1.69%
Egypt, 2, 1.69%
Egypt
2 citations, 1.69%
Republic of Korea, 2, 1.69%
Republic of Korea
2 citations, 1.69%
Finland, 2, 1.69%
Finland
2 citations, 1.69%
Estonia, 1, 0.85%
Estonia
1 citation, 0.85%
Argentina, 1, 0.85%
Argentina
1 citation, 0.85%
Israel, 1, 0.85%
Israel
1 citation, 0.85%
Italy, 1, 0.85%
Italy
1 citation, 0.85%
Canada, 1, 0.85%
Canada
1 citation, 0.85%
Kenya, 1, 0.85%
Kenya
1 citation, 0.85%
Poland, 1, 0.85%
Poland
1 citation, 0.85%
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15
20
25
30
35
  • We do not take into account publications without a DOI.
  • Statistics recalculated daily.
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